2009
DOI: 10.1299/jsmemecjo.2009.8.0_239
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T1601-1-4 Fabrication and characterization of narrow-gapped silicon dual nano probe for atomic force microscope

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Cited by 2 publications
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“…Anisotropic etching was next performed on the exposed Si surface to form a tip normal to the Si (111) plane ( Fig. 3(d-1) [2][3][4][5][6]. Finally, the SOG was removed by wet etching to separate the tip ( Fig.…”
Section: Fabrication Of Narrow-gapped Dual Afm Cantilevermentioning
confidence: 99%
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“…Anisotropic etching was next performed on the exposed Si surface to form a tip normal to the Si (111) plane ( Fig. 3(d-1) [2][3][4][5][6]. Finally, the SOG was removed by wet etching to separate the tip ( Fig.…”
Section: Fabrication Of Narrow-gapped Dual Afm Cantilevermentioning
confidence: 99%
“…But it is difficult to achieve high‐resolution observation with a tip that was previously used for cutting, and thus is worn by friction and contaminated with molecules. Consequently, we developed dual AFM cantilevers provided with two separate probes, one for cutting and another for observation . We previously formed thermal oxide films to protect the trenches on a monocrystalline Si substrate, then refilled the trenches with resin, exposed Si on the substrate surface by mechanical polishing with alumina abrasive grit, and created dual probes with a gap of about 400 nm by crystalline anisotropic etching.…”
Section: Introductionmentioning
confidence: 99%
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“…To realize in-situ imaging with high resolution after the molecular operations such as cutting, we have developed dual AFM probes which have individual nano-tips on each cantilever in order to divide the role of cutting and imaging. The concept and typical structure of the dual AFM are shown in Fig.3 [5,[15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%