1970
DOI: 10.1021/ar50033a004
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Systematic synthesis in the polysilane series

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Cited by 73 publications
(25 citation statements)
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“…Tentative suggestions for the base‐induced disproportionation mechanism adapted from the literature are compiled in Scheme and include i) concerted silylene extrusion/insertion, ii) a metathesis‐like, concerted four‐center exchange of Cl for SiCl 3 in a primary amine adduct of Si 2 Cl 6 , or iii) heterolytic Si–Si bond cleavage followed by Cl/NR 3 exchange as key elementary steps . Support for the commonly accepted role of dichlorosilylene as a key intermediate in these reactions was only recently provided. In 2011, Roesky and co‐workers were able to characterize a SiCl 2 ⋅ NHC adduct by means of X‐ray analysis .…”
Section: Introductionmentioning
confidence: 99%
“…Tentative suggestions for the base‐induced disproportionation mechanism adapted from the literature are compiled in Scheme and include i) concerted silylene extrusion/insertion, ii) a metathesis‐like, concerted four‐center exchange of Cl for SiCl 3 in a primary amine adduct of Si 2 Cl 6 , or iii) heterolytic Si–Si bond cleavage followed by Cl/NR 3 exchange as key elementary steps . Support for the commonly accepted role of dichlorosilylene as a key intermediate in these reactions was only recently provided. In 2011, Roesky and co‐workers were able to characterize a SiCl 2 ⋅ NHC adduct by means of X‐ray analysis .…”
Section: Introductionmentioning
confidence: 99%
“…Are structures II formed by SiCl 2 insertion into the P–Cl bond, or by substitutive Cl – /SiCl 3 – exchange, and how are the unsymmetric dimers formed? Related reaction paths (SiCl 2 insertion vs. Cl – /SiCl 3 – exchange) have been discussed since Urry studied the classic amine‐catalyzed disproportionation of Si 2 Cl 6 yielding Si(SiCl 3 ) 4 and SiCl 4 several decades ago.…”
Section: Introductionmentioning
confidence: 99%
“…Continuing with the theme of low-coordinate silicon chemistry, the study of Si(II) dihalides in the gas phase and under cryogenic conditions [46] has industrial relevance given the likely presence of SiF 2 during the plasma etching of elemental silicon [47] and the role of transient SiCl 2 during the high temperature synthesis of high purity silicon via the reaction of HSiCl 3 with H 2 [48]. Unfortunately attempts to isolate pure SiX 2 species results in either oligomerization or disproportionation to give SiX 4 and silicon metal.…”
Section: Trapping Silicon(ii) Halides and Hydrides In The Form Of Stamentioning
confidence: 99%