2008
DOI: 10.1021/la800134u
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Systematic Oxidation of Polystyrene by Ultraviolet-Ozone, Characterized by Near-Edge X-ray Absorption Fine Structure and Contact Angle

Abstract: The process of implanting oxygen in polystyrene (PS) via exposure to ultraviolet-ozone (UV-O) was systematically investigated using the characterization technique of near-edge X-ray absorption fine structure (NEXAFS). Samples of PS exposed to UV-O for 10-300 s and washed with isopropanol were analyzed using the carbon and oxygen K-edge NEXAFS partial electron yields, using various retarding bias voltages to depth-profile the oxygen penetration into the surface. Evaluation of reference polymers provided a scale… Show more

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Cited by 51 publications
(78 citation statements)
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“…39 NEXAFS spectra of UV-irradiated PS films are consistent with photo-oxidation proceeding from the top surface down through the film, similar to previous studies of PS photo-oxidation. 39,40 Decreasing the bias voltage of the electron yield detector during a NEXAFS (b) UV-exposed lamellar; (c) UV-exposed cylindrical. The polymers are removed by oxygen plasma etching after deposition.…”
Section: Articlesupporting
confidence: 85%
See 1 more Smart Citation
“…39 NEXAFS spectra of UV-irradiated PS films are consistent with photo-oxidation proceeding from the top surface down through the film, similar to previous studies of PS photo-oxidation. 39,40 Decreasing the bias voltage of the electron yield detector during a NEXAFS (b) UV-exposed lamellar; (c) UV-exposed cylindrical. The polymers are removed by oxygen plasma etching after deposition.…”
Section: Articlesupporting
confidence: 85%
“…38 This observation is consistent with previous demonstrations of block-selective infiltration of TiO 2 using TiCl 4 . 17 NEXAFS spectroscopy provides a surface-sensitive probe of polymer oxidation 39 and confirms the UVinduced formation of oxygen-containing functional groups with stronger Lewis basicity within the PS domain. A comparison of measurements of a ∼20 nm thick UVirradiated (5 min) PS film and an unaltered control sample (both spin-cast on Si substrates) shows the UV-induced formation of spectral peaks associated with the π* orbital of CdO bonds (π* CdO , at photon energy ∼286.4 eV) (Figure 4a).…”
Section: Articlementioning
confidence: 92%
“…From another two FIB-cut specimen (the two FIB-cut specimen used for Figure 8 were contaminated after the scanning for carbon mapping), we acquired two EELS spectra for Beta-MS by focusing the electron beam on a mesopore region (site 1) and a zeolite domain (site 2), respectively, and one EELS spectra for Beta-C (site 3) (see Figure 9). By comparing the EELS fine structures of the three sites, we learn that site 1 has a 1s π* excitation at 285.1 eV, which is conventionally assigned to large aromatics with high degrees of graphitization [55][56] and does not appear in the EELS spectra of sites 2 or 3 ( Figure 9). Sites 2 and 3 both show a peak of higher energy loss (288.6 eV for site 2 and 288.4 eV for site 3) that is absent from site 1's spectrum.…”
Section: Resultsmentioning
confidence: 99%
“…[38][39][40] In the present study, however, we varied the X-ray incidence angle at a constant value of the entrance grid bias.…”
Section: Methodsmentioning
confidence: 99%