Systematic investigations of low energy Ar ion beam sputtering of Si and Ag

Feder, René; Frost, Frank; Neumann, H.; Bundesmann, Carsten; Rauschenbach, B.

doi:10.1016/j.nimb.2013.01.056

Cited by 28 publications

(19 citation statements)

References 20 publications

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“…There is a good agreement between the data from calculation and simulation, but the energies from experiment are considerably lower. These deviations are tentatively assigned to the fact that the calculations and simulation underestimate the energy loss of the particles on their way through the target and target imperfections [12]. The target composition was assumed to be Ag 0.9 Ar 0.1 or Ag 0.9 Xe 0.1 for the simulations, whose results are shown in Figs.…”

Section: Simulation Resultsmentioning

confidence: 99%

“…Recently, we reported about the systematic investigation of the properties of secondary particles and thin films in the ion beam sputter deposition process of Si [12], Ge [13,14] and Ag [12,15,16]. Here we present, to a larger extend than in previous reports, measured energy distributions of sputtered and backscattered particles in the ion beam sputter process of Ag.…”

Section: Introductionmentioning

confidence: 82%

“…A detailed view on the experimental setup is given in Ref. [12]. An energy-selective mass spectrometer (ESMS) was used to measure the energy distribution of sputtered or backscattered ions.…”

Section: Methodsmentioning

confidence: 99%

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Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation

Bundesmann

Feder

Lautenschläger

et al. 2015

Contrib. Plasma Phys.

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Ion beam sputter deposition allows tailoring the properties of the film-forming, secondary particles (sputtered target particles and backscattered primary particles) and, hence, thin film properties by changing ion beam (ion energy, ion species) and geometrical parameters (ion incidence angle, polar emission angle). In particular, the energy distribution of secondary particles and their influence on the ion beam deposition process of Ag was studied in dependence on process parameters. Energy-selective mass spectrometry was used to measure the energy distribution of sputtered and backscattered ions. The energy distribution of the sputtered particles shows, in accordance with theory, a maximum at low energy and an E −2 decay for energies above the maximum. If the sum of incidence angle and polar emission angle is larger than 90• , additional contributions due to direct sputtering events occur. The energy distribution of the backscattered primary particles can show contributions by scattering at target particles and at implanted primary particles. The occurrence of these contributions depends again strongly on the scattering geometry but also on the primary ion species. The energy of directly sputtered and backscattered particles was calculated using equations based on simple two-particle-interaction whereas the energy distribution was simulated using the well-known Monte Carlo code TRIM.SP. In principal, the calculation and simulation data agree well with the experimental findings.

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Section: Simulation Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 82%

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Energy Distribution of Secondary Particles in Ion Beam Deposition Process of Ag: Experiment, Calculation and Simulation

Bundesmann

Feder

Lautenschläger

et al. 2015

Contrib. Plasma Phys.

Self Cite

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show abstract

“…Recently, we have reported results for sputtering of Ag targets with Ar and Xe ions under variation of ion incidence angle and primary ion energy carried out with the same setup [6,7]. The correlation of the primary and secondary process parameters and electrical and optical properties of the Ag films have also been shown [3].…”

Section: Introductionmentioning

confidence: 98%

“…Therefore, different results to those found for Ag [6] can be expected. Additionally, Ge does not have the restrictions known for Si regarding the measurements with the energy-selective mass spectrometer (ESMS) [7]. For Si, the ESMS is not able to differentiate between the mass of Si and the mass of N 2 -molecules from the residual gas, what leads to an overlay of the energy distributions.…”

Section: Introductionmentioning

confidence: 99%