Synthesis of Ultrafine Iron Nitride Particles by &amp;ldquo;Reactive Plasma-Iron&amp;rdquo; Reaction

Ohno, Shûichi; Okuyama, Hideo; Honma, Kazuhiro; Takagi, Keiichi; Honjo, Tasuku; Ozawa, Masashi

doi:10.2320/jinstmet1952.59.4_408

Cited by 3 publications

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“…16,19) M. Uda, S. Ohno et al [21][22][23] and other researchers 24) produced nitride particles with a reactive plasmametal reaction technique. They produced the nitride particles with a gas evaporation process in an N 2 atmosphere.…”

Section: Introductionmentioning

confidence: 99%

Graded TiN Coating by Supersonic Free-Jet PVD Combined with Reactive Plasma

et al. 2002

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Ceramic coating is a very popular technology for improving the properties of structural materials. A titanium nitride (TiN) coating is a typical example and has been widely applied to cutting tools, electronic devices and many other fields utilizing its superior physical properties. This paper sought to produce a graded TiN coating on a Ti substrate by combining Supersonic Free-Jet PVD (SFJ-PVD) with a reactive plasma-metal reaction technique. The authors have developed SFJ-PVD as a new coating method in which a coating film is formed by depositing nanoparticles with very high velocity onto a substrate. SFJ-PVD can provide a high deposition rate and thick film coating. Gradually changing the nitrogen flow rate during deposition produces a graded TiN coating, in which composition changes gradually from pure Ti to TiN. A monolithic TiN coating is also produced with SFJ-PVD. XRD analysis of the graded TiN detected peaks for Ti, Ti 2 N and TiN, while only a TiN peak is observed in the monolithic TiN coating. EPMA analysis of a graded coating reveals a gradual compositional change from pure Ti to TiN. Few pores or cracks are observed in a graded TiN or in a monolithic TiN formed under the optimized conditions of SFJ-PVD.

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Section: Introductionmentioning

confidence: 99%

Graded TiN Coating by Supersonic Free-Jet PVD Combined with Reactive Plasma

et al. 2002

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“…Mixing Ti and Al nanoparticles by depositing them onto the substrate produced insitu syntheses of Ti-Al intermetallic compounds in Ti-Al coatings. Coating films were prepared by SFJ-PVD combined with the reactive plasma-metal reaction technique [30][31][32] for TiN coating and graded TiN coating, which makes it possible to produce nitride particles with a gas-evaporation process in a nitrogen atmosphere and to control the composition ratio of nanoparticles by controlling the partial pressure of N 2 gas in the (He and N 2 ) mixture in the evaporation chamber. 23) One of the advantages of SFJ-PVD is that it attains the desired coating composition by controlling the mixing and depositing rate of nanoparticles formed from different sources in different evaporation chambers.…”

Section: Introductionmentioning

confidence: 99%

Ti-Al, Graded Al/AlTi, and Ti-Al-N Coatings Prepared by Supersonic Free-Jet PVD

et al. 2004

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The authors previously developed Supersonic Free-Jet PVD (SFJ-PVD) as a new coating method in which a coating film is formed by depositing nanoparticles at very high velocity onto a substrate. This SFJ-PVD provides a rapid deposition rate and produces a mixture of different kinds of nanoparticles formed in different evaporation chambers on the substrate. This paper describes the preparation of graded Al/ AlTi, Ti-Al, and Ti-Al-N coating films with SFJ-PVD. Ti-50 at%Al film and graded Al/AlTi film are produced by depositing Al and Ti nanoparticles formed in different evaporation chambers with the controlled evaporation rates of Al and Ti. Ti-Al-N film is produced by depositing nanoparticles formed in the evaporation chamber with a controlled partial pressure of N 2 in an atmosphere of He. Mixing Ti and Al nanoparticles by depositing them onto a substrate produces in-situ syntheses of -TiAl and 2 -Ti 3 Al intermetallic compounds on the substrate regardless of the substrate temperature in these experimental conditions. A smooth, compact, and defect-free structure is formed both at the interface between the substrate and the coating films and inside the coating films. XRD analysis reveals the crystal structure of the Ti-Al-N film to be TiN, Ti

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Vaporization and condensation of some refractory oxides in plasmas derived initially from argon in expanded dc arcs

Whyman

2001

Phys. Chem. Chem. Phys.

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Synthesis of Ultrafine Iron Nitride Particles by “Reactive Plasma-Iron” Reaction

Cited by 3 publications

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Graded TiN Coating by Supersonic Free-Jet PVD Combined with Reactive Plasma

Graded TiN Coating by Supersonic Free-Jet PVD Combined with Reactive Plasma

Ti-Al, Graded Al/AlTi, and Ti-Al-N Coatings Prepared by Supersonic Free-Jet PVD

Vaporization and condensation of some refractory oxides in plasmas derived initially from argon in expanded dc arcs

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