“…Gas‐phase methods such as spray pyrolysis, chemical vapor deposition (CVD) are often used to deposit thin films of metal chalcogenides on glass substrates . To date, many liquid‐phase methods have been used for the preparation of metal chalcogenide nanostructures including the liquid‐phase exfoliation method, hot injection method, single source precursor method, hydrothermal method, solvothermal method, microwave method, sonochemical method, electrodeposition method, electrospinning method, photochemical method, cation exchange method, Kirkendall effect induced method, and template‐directed method . In recent times, MOFs have been shown to be suitable precursors for the preparation of metal chalcogenide nanostructures, particularly for metal sulfides and metal selenides, usually with the assistance of S‐ and Se‐containing compounds.…”