2019
DOI: 10.1016/j.ensm.2018.08.022
|View full text |Cite
|
Sign up to set email alerts
|

Synthesis of T-Nb2O5 thin-films deposited by Atomic Layer Deposition for miniaturized electrochemical energy storage devices

Abstract: OATAO is an open access repository that collects the work of some Toulouse researchers and makes it freely available over the web where possible.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

2
31
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
8

Relationship

2
6

Authors

Journals

citations
Cited by 46 publications
(33 citation statements)
references
References 51 publications
(42 reference statements)
2
31
0
Order By: Relevance
“…As a typical intercalation anode material, the crystal structure of T‐Nb 2 O 5 in layered arrangement is quite suitable for the intercalation of Li ions. As demonstrated in Figure a1, amorphous Nb 2 O 5 (a‐Nb 2 O 5 ) was grown onto a Pt current collector, which is deposited on a Si wafer . A 30–90 nm amorphous Nb 2 O 5 film could be transformed into crystalline T‐Nb 2 O 5 phase after further annealing.…”
Section: Amos In the Lithium And Post‐lithium‐ion Batteriesmentioning
confidence: 99%
“…As a typical intercalation anode material, the crystal structure of T‐Nb 2 O 5 in layered arrangement is quite suitable for the intercalation of Li ions. As demonstrated in Figure a1, amorphous Nb 2 O 5 (a‐Nb 2 O 5 ) was grown onto a Pt current collector, which is deposited on a Si wafer . A 30–90 nm amorphous Nb 2 O 5 film could be transformed into crystalline T‐Nb 2 O 5 phase after further annealing.…”
Section: Amos In the Lithium And Post‐lithium‐ion Batteriesmentioning
confidence: 99%
“…The impetuous for the redox replacement reactions between two or more reactive metals is driven by the difference between their standard potentials [20][21][22][23][24][25][26][27][28][29][30]. This is not only the basic principle of EDRR (electrodeposition-redox replacement) but also of similar methods like surface-limited redox replacement (SLRR) [29][30][31][32] and electrochemical atomic layer deposition (e-ALD) [33][34][35][36]; the main difference is that in SLRR and e-ALD thin, defect free monolayers are formed via underpotential deposition, whereas in EDRR more porous films grow on the surface. In contrast, electrowinning (EW) relies on the direct electroplating of the desired metal element on the electrode surface-by the application of the appropriate potential or current-to produce a surface layer.…”
Section: Introductionmentioning
confidence: 99%
“…Numerous pseudocapacitive materials such as 2D Transition Metal Carbides (MXene) [10][11][12], Transition Metal Nitrides (TMN: Mo x N, VN…) [9,[13][14][15][16], or Transition Metal Oxides (TMO: RuO 2 , MnO 2 , T-Nb 2 O 5 ) [17][18][19][20][21] have been investigated for on chip micro-supercapacitors. The most straightforward solution to improve the energy performance of miniaturized electrochemical capacitors deals with the deposition of thick electrodes using these pseudocapacitive materials [2].…”
Section: Introductionmentioning
confidence: 99%