1991
DOI: 10.1016/0040-6090(91)90136-l
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Synthesis of some V2VI3 semiconductors

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Cited by 3 publications
(2 citation statements)
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“…This we attribute to a greater difficulty for the tellurium atoms to stick on silicon than to SiO 2 [6,7]. This we attribute to a greater difficulty for the tellurium atoms to stick on silicon than to SiO 2 [6,7].…”
Section: Films Deposited On Simentioning
confidence: 76%
“…This we attribute to a greater difficulty for the tellurium atoms to stick on silicon than to SiO 2 [6,7]. This we attribute to a greater difficulty for the tellurium atoms to stick on silicon than to SiO 2 [6,7].…”
Section: Films Deposited On Simentioning
confidence: 76%
“…The strong tendency in the Sb 2 Te 3 growth to form islands originates from the large vapour pressures of Te and Sb [18]. The re-evaporation and/or thermal decomposition of Sb 2 Te 3 are, as a consequence, very large.…”
Section: Coherent Hetero-epitaxy On Inas(1 1 1)mentioning
confidence: 99%