The deposition of bismuth telluride thin films, as well as of Bi-Sb-Te and Bi-Te-Se ternary alloys by hot-wall epitaxy, has been optimized on various substrates like Si, SiO 2 and SiO 2 /Si. In order to enhance the thermoelectric power, we investigated the electrical conductivity s, the Hall coefficient R H and the Seebeck coefficient S. The properties of the epitaxial films grown on SiO 2 and on SiO 2 /Si substrates are rather similar whereas for Bi 2 (Te 1-x Se x ) 3 ternary alloys, the n and p doping is close to the optimum value that can be from bona fide expected. Finally, the study of currentvoltage characteristics at room temperature, for a p-Bi 2 Te 3 -n-Bi 2 Te 3 junction allowed us to determine various and important parameters (n, R s , J s and F B ).