Synthesis of solvent stable polymeric membranes via UV depth-curing

Strużyńska-Piron, Izabela; Loccufier, Johan; Vanmaele, Luc; Vankelecom, Ivo F.J.

doi:10.1039/c3cc46795c

Cited by 50 publications

(27 citation statements)

References 50 publications

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“…Also, thinner casting layers can implement considerable savings in the production process, less contamination of the coagulation bath by leaching compounds or solvents, and different intrusion into the (non‐)woven support. Moreover, when membranes are post‐treated with e.g., UV or electron beam radiation, the beams need to penetrate over the whole depth of the membrane, thus a reduced thickness of the layer would be really favorable . Depending on a number of parameters (such as e.g., the roughness of the support, the viscosity and surface tension of the casting solution), polymer coating of less than 100 nm thick can industrially be applied easily.…”

Section: The Process Of Phase Inversionmentioning

confidence: 99%

Understanding and guiding the phase inversion process for synthesis of solvent resistant nanofiltration membranes

Hołda

Vankelecom

2015

J of Applied Polymer Sci

364

268

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Since its introduction in membrane technology in the 1960's, phase inversion by means of immersion precipitation has been widely studied for the preparation of membranes to be applied in the fields of microfiltration (MF) and ultrafiltration (UF). However, much less knowledge is available about this process in terms of integrally skinned asymmetric nanofiltration membranes, especially for more hydrophobic polymers applied in solvent resistant nanofiltration (SRNF). This review focuses on the preparation aspects of integrally skinned asymmetric membranes to be applied in the field of SRNF via phase inversion. It starts with the explanation of the basic principles of the phase inversion process, covering both thermodynamic and kinetic aspects. Further, it summarizes the parameters that significantly influence final membrane performance and morphology, including polymer type and concentration, casting solvent, additives, evaporation time, and temperature, humidity, membrane thickness, composition, and temperature of coagulation bath and post-treatment. Literature contained within this review constitutes the core references in the field of SRNF, but also several references on preparation of MF, UF, aqueous NF, and reverse osmosis (RO) membranes have been included to better clarify or illustrate certain aspects of the process.

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Section: The Process Of Phase Inversionmentioning

confidence: 99%

Understanding and guiding the phase inversion process for synthesis of solvent resistant nanofiltration membranes

Hołda

Vankelecom

2015

J of Applied Polymer Sci

364

268

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“…UVA (320-390 nm) was used as the main irradiation light. According to our previous study [39], the dose of energy to cure the membranes was chosen as 5 J/cm 2 .…”

Section: Uv-curing Of Asymmetric Psu-based Membranesmentioning

confidence: 99%

“…Usually, surface modification of PSU-membranes is targeted via UV radiation to realize grafting [37,38]. Very recently, a simple and effective method was developed to depth-cure PSU-membranes via UV-curing [39]. In this approach, UVirradiation was applied to PSU membrane films containing cross-linker and photo-initiator, prepared via non-solvent induced phase separation (NIPS) process.…”

Section: Introductionmentioning

confidence: 99%

UV-cured polysulfone-based membranes: Effect of co-solvent addition and evaporation process on membrane morphology and SRNF performance

Altun

Rémigy

Vankelecom

2017

Journal of Membrane Science

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This is an author's version published in: http://oatao.univ-toulouse.fr/20454 To cite this version:Altun, Veysi and Remigy, Jean-Christophe and Vankelecom, Ivo F.J. UV-cured polysulfone-based membranes: Effect of co-solvent addition and evaporation process on membrane morphology and A B S T R A C T Membranes consisting of a semi-interpenetrating network of polysulfone (PSU) and cross-linked polyacrylate were synthesized via non-solvent induced phase inversion followed by UV-treatment. Tetrahydrofuran (THF) or 1,4-dioxane (DIO) was added as co-solvent to the N,N-dimethylformamide (DMF)-based polymer solutions and cast films were subjected to evaporation prior to coagulation. Effects of synthesis variables on the membrane morphology and solvent resistant nanofiltration (SRNF) performance were investigated by using a Rose Bengal solution in isopropanol. By increasing the evaporation time from 0 to 100 s for the membranes prepared with THF and DIO as co-solvent respectively, rejections increased from 65.3% to 94.2% and 60.1-89.1%, while permeances decreased from 0.29 to 0.01 l/m 2 h bar and 0.41-0.08 l/m 2 h bar. A similar effect was observed when the co-solvent/solvent ratio was increased from 0/100 to 100/0: rejections increased from 63.1% to 94.9% and 59.2-90.6%, while permeances decreased from 0.43 to 0.01 l/m 2 h bar for THF-based membranes and to 0.07 l/m 2 h bar for DIO-based membranes respectively. A post-treatment was performed to increase the flux by immersing UV-cured PSU-based films in DMF for 48 h. The resultant membranes showed higher permeances and lower rejections, making them especially useful as potential candidates for stable supports to apply selective layers upon, such as e.g. in thin film composite (TFC) membranes. As observed in scanning electron microscopy, higher evaporation times and lower initial co-solvent concentrations resulted in less or even no macrovoids.

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“…Very recently, this membrane preparation method was introduced and proved to lead to solvent stable membranes with excellent performance. [ 30 ] In presented study, crosslinked membranes were prepared by UV irradiation of fi lms cast from solutions containing PSU, a PhIn, and a crosslinker. Type and concentration of PhIn, crosslinker functionality, membrane thickness, and UV dose were investigated, as well as their infl uence on the thermal and chemical properties of the resulting fi lms.…”

Section: Characterizationmentioning

confidence: 99%

“…This paper describes a detailed investigation on the UV depth‐curing, as an easy and cheap method to crosslink unmodified PSU‐based membranes in one single step. Very recently, this membrane preparation method was introduced and proved to lead to solvent stable membranes with excellent performance . In presented study, crosslinked membranes were prepared by UV irradiation of films cast from solutions containing PSU, a PhIn, and a crosslinker.…”

Section: Introductionmentioning

confidence: 99%

Parameter Study on the Preparation of UV Depth‐Cured Chemically Resistant Polysulfone‐Based Membranes

Strużyńska-Piron

Loccufier

Vanmaele

et al. 2014

Macro Chemistry & Physics

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Polysulfone‐based membranes with excellent chemical resistance and a wet thickness up to 200 μm are obtained via UV curing of unmodified polymers after careful tuning of the photoinitiating system and the crosslinker structure. Combinations of photoinitiator and crosslinker are studied in depth, followed by a characterization of the formed macromolecular structure. The performance of the resulting membranes is then evaluated through long‐term immersion in solvents. Classical depth‐curing acyl phosphine oxide‐based photoinitiators in combination with a pentaacrylate crosslinker are found to be the optimal system.

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Synthesis of solvent stable polymeric membranes via UV depth-curing

Cited by 50 publications

References 50 publications

Understanding and guiding the phase inversion process for synthesis of solvent resistant nanofiltration membranes

Understanding and guiding the phase inversion process for synthesis of solvent resistant nanofiltration membranes

UV-cured polysulfone-based membranes: Effect of co-solvent addition and evaporation process on membrane morphology and SRNF performance

Parameter Study on the Preparation of UV Depth‐Cured Chemically Resistant Polysulfone‐Based Membranes

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