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2017
DOI: 10.1109/tnano.2017.2699861
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Synthesis of RuO2 Nanowires by Alkali-Assisted Oxidation of Ruthenium in Plasma Afterglow at Atmospheric Pressure

Abstract: RuO2 nanowires are synthesized by oxidation of ruthenium thanks to a micro-post-discharge at atmospheric pressure. However, RuO2 nanowires form islands. The growth mechanism depending on surface defects, the surface density of the nanowires is limited. We report on the influence of two alkali salts, NaCl and KCl, deposited as grains on ruthenium to act as defects and increase the nanowire density. These grains induce the growth of RuO2 nanowires all around them, creating a circular area where nanowires are fou… Show more

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Cited by 2 publications
(2 citation statements)
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“…In this work, we propose another strategy to synthesize ultrathin ZnO nanostructures with high growth rates, by using flowing microwave plasma afterglow-assisted oxidation treatments. Plasma afterglowassisted oxidation processes enable the synthesis of a large variety of metallic oxide nanostructures, even at atmospheric pressure [20][21][22]. Indeed, afterglow processes benefit from a higher reactivity of the oxidizing gas phase at moderate temperature compared to thermal heating processes, because of the presence of active oxygen species like oxygen atoms or metastable states of O 2 .…”
Section: Introductionmentioning
confidence: 99%
“…In this work, we propose another strategy to synthesize ultrathin ZnO nanostructures with high growth rates, by using flowing microwave plasma afterglow-assisted oxidation treatments. Plasma afterglowassisted oxidation processes enable the synthesis of a large variety of metallic oxide nanostructures, even at atmospheric pressure [20][21][22]. Indeed, afterglow processes benefit from a higher reactivity of the oxidizing gas phase at moderate temperature compared to thermal heating processes, because of the presence of active oxygen species like oxygen atoms or metastable states of O 2 .…”
Section: Introductionmentioning
confidence: 99%
“…The vacuum-based techniques include physical vapor deposition, chemical vapor deposition (CVD), and atomic layer deposition (ALD). [13][14][15][16] In practice, these vacuum-based approaches often entail complicated equipment, costly precursors, slow processing time, and unnecessary material waste. In contrast, the solution-based routes such as sol-gel synthesis, electroless plating, and electrodeposition are known for simple setups, inexpensive precursors, and adaptability to substrates with different form factors.…”
mentioning
confidence: 99%