Synthesis of Novel Organometal-Containing Polymers and Their Properties as Electron-Beam Resist Materials.

Kato, Norikiyo; Suruga, Toshihide; Takeda, Kenta; Nagasaki, Yukio; Kato, Masaru

doi:10.2494/photopolymer.5.585

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1993

1994

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“…3 It also exhibited a nega-type resist behavior against EB exposure owing to cross-linking reactions2 and remarkably high resolution properties (the resolution parameter = 8.1). 4 In terms of sensitivity, however, poly (BSMS) was not so good, because their high glass transitions prevented intermolecular cross-linking reactions to some extent.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Anionic Polymerizations of p-[Bis(trimethylsilyl)methyl]isopropenylbenzene

Nagasaki¹,

Yamazaki²,

Takeda³

et al. 1994

Macromolecules

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p-[Bi~(trimethylsilyl)methyllisopropenylbenzene (BSIB) was prepared by reaction of a,pdimethylstyrene (DMST) with lithium diisopropylamide (LDA) and trimethylsilyl chloride (TMSCI). Anionic polymerization of BSIB with sec-butyllithium (BuLi) or living lithium a-methylstyrene oligomers at -50 OC in THF gave polymers with the predicted molecular weights and narrow molecular weight distributions. When the temperature of the polymerization mixture was increased up to 20 "C after the monomer was almost completely consumed, the polymer formed disappeamd almost completely, indicating the anionic polymerization of BSIB to be a living equilibrium system. The ceiling temperature of BSIB in the anionic polymerization was 1.2 f 0.9 "C,

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Section: Introductionmentioning

confidence: 99%