Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist

Liu, Jingcheng; Zheng, Xiao; Hu, Li; Liu, Ren; Mu, Qidao; Liu, Xiaoya

doi:10.1007/s00289-014-1289-9

Cited by 8 publications

(9 citation statements)

References 25 publications

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“…Photopolymerization has attracted increasing attention in recent years due to its broad applications in adhesives, [1] coatings, [2] printing inks, [3] 3D printing, [4,5] photoresists, [6] and microelectronics [7] (Figure 1).…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of a One‐Component Water‐Soluble Photoinitiator Based on Thioxanthone Derivatives

Lin,

Ge,

Tang

2023

Macro Chemistry & Physics

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Thioxanthone derivatives with additional amino groups (TX‐S‐NH3) are synthesized via a simple esterification reaction between TX‐S‐CH2‐COOH and 2‐methylaminoethanol hydrocarbons in a p‐toluene sulfonic acid medium. The TX‐S‐NH3 is characterized by 1H NMR, 13C NMR, FT‐IR, HRMS, ultraviolet‐visible spectrophotometry, and fluorescence spectroscopy. TX‐S‐NH3 has strong absorption in water and ethanol, and the molar extinction coefficients at 395 nm are 2800 and 2780 mol−1L cm−1, respectively. TX‐S‐NH3 shows a low fluorescence quantum yield of 0.109 in deionized water. The maximum mobility of TX‐S‐NH3 in the photocuring product in ethanol is 12.5%. The double bond conversion of TMPTA cured by TX‐S‐NH3 is 60.7% without co‐initiator. TX‐S‐NH3 has excellent curing effects in UV‐curable ink with a light curing time of only 2.3 s.

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Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of a One‐Component Water‐Soluble Photoinitiator Based on Thioxanthone Derivatives

Lin,

Ge,

Tang

2023

Macro Chemistry & Physics

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“…These waterborne photoresists feature being prone to purify, cost-effective, and nontoxic, which is apt to bring about a promising avenue for eco-friendly development of photoresists in the future. 15,16 Hence, this study focuses on the choice and investigation of a waterborne photoresist as a preferred material. Furthermore, the development of high-performance waterborne photoresists necessitates the design of high-performance photoresist resins that satisfy industrial standards.…”

Section: Introductionmentioning

confidence: 99%

“…Moreover, it poses a threat to operators in terms of health and safety that VOCs have been linked to symptoms such as drowsiness, headaches, and vertigo. − Prolonged exposure to high levels of VOCs may lead to respiratory diseases, cancer, and fatalities. , To address these concerns, waterborne photoresists have emerged as a research and development hotspot in recent years. These waterborne photoresists feature being prone to purify, cost-effective, and nontoxic, which is apt to bring about a promising avenue for eco-friendly development of photoresists in the future. , Hence, this study focuses on the choice and investigation of a waterborne photoresist as a preferred material.…”

Section: Introductionmentioning

confidence: 99%

Assisted Preparation of Waterborne Anti-etching Coating for Printed Circuit Board Photoresist Using Dibenzoyl Peroxide/Copper(II)-Phthalocyanine at Room Temperature

Xu,

Li,

Wang

et al. 2023

ACS Appl. Polym. Mater.

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The waterborne printed circuit board (PCB) photoresist is a photopolymer material that offers several environmental advantages over traditional solvent-borne PCB photoresists, including low pollution, low volatility, and easy cleaning, which can effectively reduce occupational health risks. This paper presents a simple stirring-resting step-reaction at room temperature and atmospheric environment to achieve the cross-linking copolymerization of waterborne acrylic resin with trimethylolpropane triacrylate (TMPTA) through the self-decomposition reaction of dibenzoyl peroxide (BPO) with copper(II)-phthalocyanine (CuPc). Subsequently, a modified resin with both thermosetting and photosetting properties was formulated to produce a waterborne eco-friendly PCB photoresist with low volatile organic compounds (VOCs). The photoresist exhibits good water solubility and can be diluted to a maximum of 12% water content while ensuring a resolution of 35 μm. Additionally, the printing performance and rheological characteristics of photoresists with different TMPTA ratios and water contents were analyzed. It was found that the photoresist exhibited the best-related performances when the ratio of acrylic resin to TMPTA was 3:7 and the water content was 9%. This formulation requires readily available raw materials, low production equipment requirements, and simple operation and is suitable for mass production.

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“…Photoresists find applications in integrated circuits, buffer coat layers for IC chips, manufacturing of printing plates, and color, filters [19]. Photoresist on being exposed to high-energy radiations, such as ultraviolet (UV) light, electron-beam, or X-rays, leads to certain chemical reactions in the exposed areas, changing its solubility.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of UV-curable polycarbonate diols (PCDL)-based polyurethane acrylate for negative photoresist

Liu

Zheng

et al. 2015

Polym. Bull.

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Two kinds of UV-curable polyurethane acrylates (PCDL-H-PUA and PCDL-P-PUA) were synthesized starting with polycarbonate diols (PCDL), isophorone diisocyanate and dimethylolpropionic acid and terminated with hydroxyethyl methacrylate or pentaerythritol triacrylate to impart mono-methacrylate or tri-acrylate end-group functionality, respectively. The structures and properties of the products were characterized by Fourier transform infrared spectroscopy, proton nuclear magnetic resonance spectroscopy, gel permeation chromatography and thermogravimetric analysis. The average molecular weights were between 7500 and 9300 g/mol, and the thermal properties of the products were excellent. The influence of the functionality of the end-capping functional group on the UV-curing behavior was investigated using real-time spectroscopy. Results showed that curing rate and conversion of PCDL-P-PUA were higher than those of PCDL-H-PUA, and the final double bond conversion of the polymers reached 95 %. PCDL-H-PUA and PCDL-P-PUA were applied to negative photoresists as the main film resin. The resolution of the optimal photoresist reached 40 lm.

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Synthesis of novel branched UV-curable methacrylate copolymer and its application in negative photoresist

Cited by 8 publications

References 25 publications

Synthesis and Characterization of a One‐Component Water‐Soluble Photoinitiator Based on Thioxanthone Derivatives

Synthesis and Characterization of a One‐Component Water‐Soluble Photoinitiator Based on Thioxanthone Derivatives

Assisted Preparation of Waterborne Anti-etching Coating for Printed Circuit Board Photoresist Using Dibenzoyl Peroxide/Copper(II)-Phthalocyanine at Room Temperature

Synthesis of UV-curable polycarbonate diols (PCDL)-based polyurethane acrylate for negative photoresist

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