Synthesis of Nanostructure TiO2 Films Using Different Applied Powers of Pulsed Magnetron Sputtering

Abstract

Abstract-The purpose of this article was to survey the microstructure and various properties (optical -electricalmechanical) of (TiO 2 ) thin coating on glass-substrate by pulsedmagnetron-sputtering (PMS) method. The coatings were deposited by sputtering pure Ti target at a mixture of 90%Ar and 10% O 2 under a constant total working gas pressure of 5x10 -3 mbar. The plasma (applied power) with (120 kHz) frequency was varied from 100 W to 225 W for operation time of 25 min. The structural and various properties (optical-electrical-mechanical) of (TiO 2 ) thin coating with the various (applied powers) have been investigated. XRD spectra show the genesis of (TiO/TiO 2 ) rutile-phase, as outcome of plasma oxygen. The bandgap of the TiO 2 increased up to 4.02 eV as the (applied power) increases up to 200 W. The gained data show an increase of TiO 2 transmittance and a decrease of its reflectance as (applied power) increases.