Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature

Abstract

This paper reports the synthesis of nanostructure carbon (ns-carbon) films deposited by microwave plasma-enhanced chemical vapor deposition (MW PECVD) technique at low pressure and room temperature. ns-carbon films have been characterized by scanning electron microscopy, electron dispersive x-ray spectroscopic analysis, atomic force microscopy, Raman spectroscopy, X-ray diffraction, UV-visible spectroscopy and high-resolution transmission electron microscopy. The shape of nanostructure is changing from granular to sheet-like structure when the pressure increased from 55 to 110 mTorr.

Effect of the aromatic precursor flow rate on the morphology and properties of carbon nanostructures in plasma enhanced chemical vapor deposition

“…On the other side, RF PECVD is a low temperature deposition method and of advantage when coating temperature sensitive substrates. [11][12][13] The vertical alignment of the nanostructures in all three cases results from the electric eld of the plasma. 14,15 The application of plasma in PECVD method, compared with CVD, greatly decreases process temperature and allows to improve alignment and direction of the nanomaterial growth.…”