“…Another immediate application is in switching devices which can be controlled by electric and magnetic fields. MEMS/NEMS devices can also be grown by a bottom up process over silicon chip with properly designed masks (template assisted deposition 28,29 ), or can be directly fabricated starting from a nanowire synthesised by self assembly/induced assembly (non template process) and hence the synthesis can be integrated to the silicon integrated device technology. Here, a 5 step deposition is needed (lower contact electrode, BTO, CoFe, BTO, upper contact electrode) which is to be deposited over a pre fabricated mask SCHEME 2.…”