Synthesis of CuS thin films by microwave assisted chemical bath deposition

Effect of substrate on electroplated copper sulphide thin films

“…The value of real and imaginary dielectric constants are determined using Eqs. (11) and (12). Variation of real and imaginary part of dielectric constants (e 1 and e 2 ) with respect to wavelength (k) for Cu 2 S thin films obtained on different substrates is shown in Figs.…”

“…65-2980. Number of techniques have been reported for the preparation of Cu 2 S thin films with device quality such as, thermal evaporation [9], RF reactive sputtering [10], hydrothermal technique [11], microwave assisted chemical bath deposition [12], chemical vapour deposition [13], successive ionic layer adsorption and reaction technique [14], atomic layer deposition [15], spraypyrolysis [16]. Among them, electrodeposition is one of the appropriate methods to prepare good quality films.…”

Crystalline phase evolution in nanostructured copper sulfide thin films prepared by spray pyrolysis method: the effect of annealing

“…For example, in Cu x S compositions the resistivity of layers ranges from 10 Ω·cm to 10 −4 Ω·cm for x = 2 to x = 1 [10]. Also a direct band gap of 1.25 eV to 3.2 eV has been reported for samples with different phases and compositions prepared by different techniques under different conditions [2,11,12,[14][15][16]. Thin layers of copper sulfide contain five * E-mail: roshanrafiei@yahoo.com stable phases at room temperature including: covellite (CuS), analite (Cu 1.75 S), digenite (Cu 1.8 S), djurleite (Cu 1.95 S) and chalcocite (Cu 2 S) [17][18][19][20][21][22][23].…”

The effect of complexing agent on crystal growth, structure and properties of nanostructured Cu2−xS thin films

“…225 226 227 Na 2 S 2 O 3 is reducing agent by virtue of the half cell reaction [32]. 228 In the acidic medium of pH 2.3, sodium thiosulfate gradually 229 release sulfide ions upon hydrolytic decomposition [33].…”