Synthesis of cobalt oxide (Co3O4) thin films by electrostatic spray pyrolysis technique (ESP)

The High Efficient Investigations of Properties of Co3O4 Nanostructured by Facile Spray Pyrolysis Technique for Future Gas Sensors Application

“…All microstructural parameters of Co 3 O 4 thin layers deposited at various temperatures are shown in Table 1 . Our microstructural results are similar to the reported ones prepared by electrostatic spray pyrolysis [ 36 ] and superior to those deposited by costly RF‐sputtering needing oxygen pressure. [ 37 ]…”

Low-Temperature Atomic Layer Deposition of Cobalt Oxide as an Effective Catalyst for Photoelectrochemical Water-Splitting Devices

“…7,9,12,[18][19] The development of methods allowing for precisely controlled deposition of cobalt oxide films is therefore of crucial importance. Typical methods for the fabrication of cobalt oxides include sol-gel processes, [20][21][22] spray pyrolysis, [23][24][25][26] electrodeposition 7 or physical vapor deposition (PVD) [27][28][29][30] . However, in terms of the precise control over the phase and thickness, these methods are outperformed by chemical vapor deposition (CVD) and atomic layer deposition (ALD).…”

“…Nanostructured spinel cobalt­(II,III) oxide has been receiving enormous attention because of its various applications in electrochemistry, catalysis, gas sensing, and batteries and energy storage. − In particular, the use of cobalt oxide as an efficient electrocatalyst for water oxidation − is of paramount importance as the water oxidation reaction is typically the key kinetic bottleneck in most electrocatalytic and photoelectrocatalytic water-splitting systems, which are currently envisaged as highly promising approaches to secure the future supply of low-cost and sustainable energy. − In general, the activity of electrocatalysts and their applicability in solar-driven water-splitting devices depends on various factors, including their composition, morphology, thickness, and optical properties. ,,,, The development of methods allowing for precisely controlled deposition of cobalt oxide films is therefore of crucial importance. Typical methods for the fabrication of cobalt oxides include sol–gel processes, − spray pyrolysis, − electrodeposition, or physical vapor deposition (PVD). − However, in terms of the precise control over the phase and thickness, these methods are outperformed by chemical vapor deposition (CVD) and atomic layer deposition (ALD) . Out of these techniques, in particular ALD represents a unique and powerful technique that is capable of depositing films with exceptional conformality, distinct morphology, and phase control on a nanometer scale , including deposition of materials over complex-shaped substrates.…”

Study of Structural Properties of Ni3Pb2S2 Films

“…X-ray diffraction has many advantages such as the cheapest technique, x-rays are not absorbed very much by air and the samples need not be in an evacuated chamber. Therefore, this technique was used to investigate the structure of samples by many researchers [21][22][23][24][25] . Fig.…”