Synthesis of carbon nanowalls by the method of plasma enhanced chemical vapor deposition in a radio-frequency discharge plasma

Abstract

Ерланулы Е. и др. with Ar ions enhances the surface reaction in the growth phase, including the adsorption of hydrocarbon radicals on dangling bonds (defects), while an increase in ion irradiation (increase in RF power) impedes further vertical growth of carbon nanostructures due to the etching effects. This phenomenon explains the emergence of agglomerated CNWs with increasing discharge power.