2013
DOI: 10.1016/j.ssc.2013.05.012
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Synthesis of arsenic-doped p-type ZnO films by addition of As2O3 to the ZnO spin coating solution

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Cited by 8 publications
(4 citation statements)
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“…This may be the reason carrier density increased during the electron beam treatment process. Although a significant improvement in grain size by electron beam treatment was not observed in the current study, there is a chance that it improves the crystallinity of ZnO film [15], which would contribute to the increase in carrier mobility. In summary of the above discussion, increases in carrier concentration and mobility of undoped and In-doped ZnO films can be achieved by applying the proper electron beam treatment.…”
Section: Electrical Properties Of the Zno Thin Filmscontrasting
confidence: 59%
See 1 more Smart Citation
“…This may be the reason carrier density increased during the electron beam treatment process. Although a significant improvement in grain size by electron beam treatment was not observed in the current study, there is a chance that it improves the crystallinity of ZnO film [15], which would contribute to the increase in carrier mobility. In summary of the above discussion, increases in carrier concentration and mobility of undoped and In-doped ZnO films can be achieved by applying the proper electron beam treatment.…”
Section: Electrical Properties Of the Zno Thin Filmscontrasting
confidence: 59%
“…Since the process of electron beam treatment can be conducted in a couple of minutes, throughput of the ZnO crystallization process will be increased by at least 100-fold if the annealing process, whose whole process time is more than couple of hours, is replaced by electron beam treatment. In addition, since electron beam treatment on ZnO produces higher carrier concentrations [15], it is expected that electron beam treatment plays a similar role as the doping process. If the electron beam treatment can be used to address the deterioration of electrical properties observed at high In-doping levels, this method will result in reducing the use of indium, which is a rare earth element.…”
mentioning
confidence: 99%
“…However, it is difficult to achieve reliable and reproducible p-type ZnO for developing ZnO-based devices because ZnO exhibits natural n-type conductivity. There have been a number of recent reports on the synthesis of p-type ZnO doped by group-V elements (e.g., N, P, and As) substituting for O, or group-I elements (e.g., Li and Na) substituting for Zn, to realize high-quality p-type ZnO [7][8][9][10]. Among these dopants, N is a shallow acceptor and its ionic radius is very similar to that of O, unlike those of P and As.…”
Section: Introductionmentioning
confidence: 99%
“…The most likely candidates for the n-type behaviour at present are unintentional hydrogen doping [80][81] and zinc interstitial nitrogen complexes (Zni-NO) [80] . P type doping has been reported with N [84][85] ,P [86][87] ,Sb [88] , As [89][90] [91] , Ag [92] , Li [93][94] , Na [95][96] [97] dopants with variety of methods and mechanisms. Reproducibility however, has been a major problem [83] [83] , with the unintentional n-type dopants both shallow and deep usually act to compensate and counteract any intended doping [78][80] .…”
Section: General Propertiesmentioning
confidence: 99%