2011
DOI: 10.1016/s1005-0302(11)60129-1
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Synthesis of Aligned ZnO Nanorod Array on Silicon and Sapphire Substrates by Thermal Evaporation Technique

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Cited by 30 publications
(16 citation statements)
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“…Differrent morphologies of ZnO structures such as nanorods [1][2][3], nanowires [4,5], hollow spheres [6], hammershaped particles [7], nanocubes [8], nanoparticles [9,10], tetrapod [11], nanotubes [12,13] and nanocrystals [10,14] have been synthesized by both chemical and physical methods: sol-gel process [15][16][17], hydrothermal process [18][19][20], thermal evaporation [3,7,9,11], chemical vapor deposition (CVD) [6,21,22], ultrasonicassisted synthesis [8,14,23] and microwave radiation [24][25][26][27].…”
Section: Introductionmentioning
confidence: 99%
“…Differrent morphologies of ZnO structures such as nanorods [1][2][3], nanowires [4,5], hollow spheres [6], hammershaped particles [7], nanocubes [8], nanoparticles [9,10], tetrapod [11], nanotubes [12,13] and nanocrystals [10,14] have been synthesized by both chemical and physical methods: sol-gel process [15][16][17], hydrothermal process [18][19][20], thermal evaporation [3,7,9,11], chemical vapor deposition (CVD) [6,21,22], ultrasonicassisted synthesis [8,14,23] and microwave radiation [24][25][26][27].…”
Section: Introductionmentioning
confidence: 99%
“…However, metallic catalyst is often used in the synthesis process and it is very difficult to remove its residues completely, which will heavily affect the investigation of their application properties. Although some catalyst-free methods have been developed on sapphire or Si substrate [25,26], little work has been done about catalyst-free growth of 1D ZnO nanostructures on SiO 2 substrate which is compatible with semiconductor technology.…”
Section: Introductionmentioning
confidence: 99%
“…For these reasons, ZnO is considered as a good candidate for optical devices in the near UV region [8], and for the short wavelength-emitting devices such as light emitting diodes [2]. ZnO with different morphologies can be prepared by various deposition techniques such as magnetron sputtering [9], chemical vapour deposition [10], pulsed laser deposition [11], spray pyrolysis [12] or thermal evaporation [13] and so on. Among all approaches, electrodeposition technique has been emerging as a competitive technique for the fabrication of metallic oxide semiconductor nanostructures with different shape and sizes [14][15][16][17].…”
Section: Introductionmentioning
confidence: 99%