2016
DOI: 10.1007/s10854-016-4861-2
|View full text |Cite
|
Sign up to set email alerts
|

Synthesis of Ag–Cu–Pd alloy by DC-magnetron sputtering: micromorphology analysis

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2018
2018
2024
2024

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 9 publications
(2 citation statements)
references
References 41 publications
0
2
0
Order By: Relevance
“…By use of small amounts of Pd addition in Ag, thin Ag coatings have been achieved in the past. 29,27,39,40 Our results show that purposefully adding small amounts of oxygen in the in the plasma during sputtering of APC, up to about Γ = 3%, promotes formation a superficial PdO x phase that prevents particle agglomeration in a controlled way leading to ultrathin, continuous, electrically conducting APC:O films. In contrast, too high Γ values lead to extensive PdO formation evident in Figure 4, with an increased surface roughness (Figure 3) and deteriorating electrical properties (Figure 6).…”
Section: Resultsmentioning
confidence: 99%
“…By use of small amounts of Pd addition in Ag, thin Ag coatings have been achieved in the past. 29,27,39,40 Our results show that purposefully adding small amounts of oxygen in the in the plasma during sputtering of APC, up to about Γ = 3%, promotes formation a superficial PdO x phase that prevents particle agglomeration in a controlled way leading to ultrathin, continuous, electrically conducting APC:O films. In contrast, too high Γ values lead to extensive PdO formation evident in Figure 4, with an increased surface roughness (Figure 3) and deteriorating electrical properties (Figure 6).…”
Section: Resultsmentioning
confidence: 99%
“…However, the suitable selection of the analysis method of the AFM data is crucial to extract the relevant information to characterize the morphology properties of surfaces. For this reason, a variety of approaches based on the use of functional characterizations and fractal analysis have been implemented during the last few years in the study of thin films [16][17][18][19][20][21][22].…”
Section: Introductionmentioning
confidence: 99%