2017
DOI: 10.1016/j.matchemphys.2017.08.056
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Synthesis, crystal structure and vapour pressure studies of novel nickel complex as precursor for NiO coating by metalorganic chemical vapour deposition technique

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Cited by 14 publications
(22 citation statements)
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“…The first proposed Schiff-base type Ni precursor was reported by Basato et al They synthesized several β-imino carbonyl enolato complexes of nickel­(II), one of which was successfully used for metalorganic (MO) CVD of NiO . Recently, Chandrakala et al reported the synthesis and thermal evaluation of the square planar bis­( N -propyl-3-methylsalicylaldimine)­nickel­(II), which was employed in a plasma enhanced MOCVD process for the deposition of NiO . These not only require high volatilization temperatures but also resulted in films contaminated with carbon impurities.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The first proposed Schiff-base type Ni precursor was reported by Basato et al They synthesized several β-imino carbonyl enolato complexes of nickel­(II), one of which was successfully used for metalorganic (MO) CVD of NiO . Recently, Chandrakala et al reported the synthesis and thermal evaluation of the square planar bis­( N -propyl-3-methylsalicylaldimine)­nickel­(II), which was employed in a plasma enhanced MOCVD process for the deposition of NiO . These not only require high volatilization temperatures but also resulted in films contaminated with carbon impurities.…”
Section: Introductionmentioning
confidence: 99%
“…31 Recently, Chandrakala et al reported the synthesis and thermal evaluation of the square planar bis(N-propyl-3-methylsalicylaldimine)nickel(II), which was employed in a plasma enhanced MOCVD process for the deposition of NiO. 32 These not only require high volatilization temperatures but also resulted in films contaminated with carbon impurities.…”
Section: Introductionmentioning
confidence: 99%
“…In fact, even with the issue of precursor stability, MOCVD has a fast growth rate and provides a high level of control over film stoichiometry [ 56 ]. As a way to reduce the temperature, plasma-assisted MOCVD (PA-MOCVD) has been employed to produce a stoichiometric NiO phase [ 57 ]. Metal-oxide growth through MOCVD is still a challenge from a chemistry perspective, as the precursors may be volatile and even carbon-rich [ 57 , 58 ].…”
Section: Synthesis Of P-type Mox Thin Filmsmentioning
confidence: 99%
“…As a way to reduce the temperature, plasma-assisted MOCVD (PA-MOCVD) has been employed to produce a stoichiometric NiO phase [ 57 ]. Metal-oxide growth through MOCVD is still a challenge from a chemistry perspective, as the precursors may be volatile and even carbon-rich [ 57 , 58 ].…”
Section: Synthesis Of P-type Mox Thin Filmsmentioning
confidence: 99%
“…From the obtained values, it is clear that the band gap values depend on both MWCNTs support and the TiO 2 percentages in the binary nanocomposites. The variation of the band gap with increasing the particle size is an important role for photocatalytic activity of MWCNTs/x%TiO 2 nanocomposites [25][26][27]. The functionalization of MWCNTs and TiO 2 is expected to enhance the efficiency of the photocatalytic activity of the produced nanocomposites.…”
Section: (1)mentioning
confidence: 99%