“…NH 3 -TPD (temperature-programmed desorption) studies show that there are two desorption peaks. The peak at lower temperature is due to the weak acid sites originating from surface POH, SiOH or AlOH groups, and the peak at higher temperature is due to the moderately strong acid sites in the form of bridging hydroxyl groups [9][10][11]. The acid strength is independent on the content of Si atoms, the SAPO-34 particle size and the metal incorporation [12,13], and the number of the strong acid sites did not change significantly with the silicon content of the synthesis gels [14].…”