Synthesis and thermal decomposition studies of homo- and heteroleptic tin(iv) thiolates and dithiocarbamates: molecular precursors for tin sulfides

Barone, Giampaolo; Chaplin, Tracy; Hibbert, Thomas G.; Kana, Aliki T.; Mahon, Mary F.; Molloy, Kieran C.; Worsley, Ian D.; Parkin, Ivan P.; Price, Louise S.

doi:10.1039/b108509n

Cited by 82 publications

(61 citation statements)

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“…Sn(S 2 CNEt 2 ) 2 , and thiuram, intermediates. Later work [27] showed that the final product was SnS 2 4 ], where the dithiocarbamate is derived from pyrrolidine. [29] …”

Section: Synthetic Precursors For Tin Sulfidesmentioning

confidence: 99%

“…the longer Sn-S bond distance formed by the chelating ligand is trans-to the sulfur atom of the monodentate ligand. The following three structures to be described, Sn(S 2 CNEt 2 ) 2 (SR) 2 for R D CH 2 CF 3 , Ph and c-Hex, are of interest in terms of their potential as precursors for the deposition of tin sulfide powders; [27] the R D c-Hex derivative is illustrated in Fig. 4.…”

Section: Structural Chemistrymentioning

confidence: 99%

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Tin dithiocarbamates: applications and structures

Tiekink

2008

Applied Organom Chemis

193

153

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The uses and potential utility of tin/organotin dithiocarbamate, − S 2 CNR 2 , compounds are reviewed. Various derivatives exhibit exciting potential as anti-cancer agents, anti-microbial agents and insecticides, e.g. against mosquito larvae. Tin dithiocarbamates have also proven useful as precursors for tin sulfide nanoparticles. There is a wealth of structural data available for such compounds and with the exception of the diorganotin bis(dithiocarbamate) compounds, R 2 Sn(S 2 CNR 2 ) 2 , compounds for which different structural motifs are evident, there is a certain degree of homogeneity in the molecular structures for each class of compound unless there are additional coordination sites on the R and/or R groups. Owing to the strong coordination potential of the dithiocarbamate ligand for tin, supramolecular aggregates involving secondary Sn· · ·S interactions are the exception rather than the norm.

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“…Sn(S 2 CNEt 2 ) 2 , and thiuram, intermediates. Later work [27] showed that the final product was SnS 2 4 ], where the dithiocarbamate is derived from pyrrolidine. [29] …”

Section: Synthetic Precursors For Tin Sulfidesmentioning

confidence: 99%

Section: Structural Chemistrymentioning

confidence: 99%

Tin dithiocarbamates: applications and structures

Tiekink

2008

Applied Organom Chemis

193

153

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“…Toluene, benzene, n-hexane and n-pentane were dried over and distilled from sodium/potassium alloy, degassed and stored over a potassium mirror. Chloroform and dichloromethane were dried over and distilled from P 2 35,36 were prepared using published methods.…”

Section: General Remarksmentioning

confidence: 99%

Structural study of C,N‐chelated monoorganotin(IV) halides

Novák

Padělková

Cı́sařová

et al. 2006

Applied Organom Chemis

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Three monoorganotin(IV) compounds of general formula LCNSnX3, where LCN is a 2‐(dimethylaminomethyl)phenyl‐ group and X = Cl (1), Br (2) and I (3), were prepared and characterized using XRD and NMR techniques. Compound 1 reacts with moisture producing [(LCN)2HSnCl2]+ [LCNSnCl4]−. Compound 3 decomposes to (LCN)2SnI2, SnI2 and I2 when heated. Compound 2 was reacted with NH4F yielding an equilibrium of fluorine‐containing species. The major products were [LCNSnF5]2− and [(LCNSnF3)2(µ2‐F)2]2− (4a). When compound 2 was reacted with another fluorinating agent, LCN(n‐Bu)2SnF, an oligomeric product, [LCNSnF2(µ2‐F)2]n, was observed. Further addition of NH4F led to subsequent formation of 4a. The structure of fluorinated products was investigated by 1H, 19F and 119Sn NMR spectroscopy. Copyright © 2006 John Wiley & Sons, Ltd.

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“…[2,5,14,15] A second technique is physical vapor deposition from a SnS target such as thermal evaporation, [16][17][18] RF sputtering, [19] and electron beam evaporation. [20] The last method uses transport by chemical vapors such as chemical spray pyrolysis, [21][22][23] chemical vapor deposition (CVD), [6,[24][25][26][27] and atomic layer deposition (ALD). [28] Due to various oxidation states of tin (0, +2, and +4), traces of other phases (i.e.…”

Section: Introductionmentioning

confidence: 99%