The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolitemembranes.Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from aS SZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO 2 perm-selectivities,having maximum CO 2 /N 2 and CO 2 /CH 4 separation factors (SFs) as high as about 17 and 279, respectively,a t3 0 8 8C. Furthermore,t he hybrid membrane maintains the CO 2 perm-selectivity in the presence of water vapor (the thirdm ain component in both cases), that is,CO 2 / N 2 SF of about 14 and CO 2 /CH 4 SF of about 78, respectively,at 50 8 8C( ar epresentative temperature of both CO 2 -containing streams).