Synthesis and properties of silicon dioxide films prepared by pulsed laser deposition using ceramic SiO2 target

He, Xiliang; Jian-gang, WU; Li, Xiaomin; Gao, Xiangdong; Zhao, Lili; Wu, Lingnan

doi:10.1016/j.apsusc.2009.08.005

Cited by 5 publications

(3 citation statements)

References 20 publications

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“…Due to its versatility, this technique has extended to include the deposition of a great number of materials, ranging from pure elements to multicomponent compounds [9] [10]. Compared to other physical deposition techniques, PLD has the advantage of easily and amply controlling the physical, chemical and structural properties of many materials [11], as well as in many cases the capacity to preserve the stoichiometry.…”

Section: Introductionmentioning

confidence: 99%

Comparison on Morphological and Optical Properties of TiO<SUB>2</SUB> Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Peñaloza-Mendoza¹,

Ponce-Cabrera²

2015

JSEMAT

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TiO2 thin films were prepared on glass substrates using the PLD (Pulsed Laser Deposition) technique. In order to carry out the ablation process, a Nd:YAG laser was used emitting in 1064 nm wavelength at 10 Hz repetition rate, set up for operating in both single-pulse and multi-pulse regimes. A comparison of the deposition rate, the optical and morphological properties of the layers obtained from both ablation regimes was made, which showed that the multi-pulsed ablation produced layers with a higher surface quality and better optical properties.

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Section: Introductionmentioning

confidence: 99%

Comparison on Morphological and Optical Properties of TiO<SUB>2</SUB> Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Peñaloza-Mendoza¹,

Ponce-Cabrera²

2015

JSEMAT

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“…The focal plane is at z = 1 μm. The dielectric constants of the silver and BK7 glass can be found in [19,20].…”

Section: Zone Plate Structures and Simulation Setupmentioning

confidence: 99%

Modulation of optical focusing by using optimized zone plate structures

Li¹,

Lin²,

Tsai³

et al. 2010

Opt. Express

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The focusing properties of the optimized zone plate structures which have upper and lower zones with different thicknesses are studied by the three-dimensional finite-difference time-domain method. Two kinds of materials are chosen, including silver representing metal and BK7 glass representing dielectric. An optimization algorithm is applied to tune the parameters of zone plate structures. Several optimized zone plate structures with smaller circular-shape focus are presented. By using the angular spectrum representation method, we found that the cases with smaller focal sizes have larger high-k components; however, the intensities of side lobes also become larger in comparison with the main beam. It is also found that the phase differences between different spatial field components can have the influences on focusing properties. A special case with two focuses is shown by changing the cost function of the same optimization algorithm. Our findings suggest that the optimized zone plate structures can reconstruct the light intensity distribution and have a great potential for the applications in imaging, lithography, and data storage.

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“…Silicon dioxide is the main film-forming material with a low refractive index. SiO 2 films are produced using both metal [8][9][10] and oxide targets [11][12][13][14][15]. In the case of metal targets, individual atoms and metallic clusters pass into the gas phase from the target and are oxidized by the oxygen flow supplied to the vacuum chamber.…”

Section: Introductionmentioning

confidence: 99%

Silicon Dioxide Thin Films Deposited Using Oxide Targets: Results of Atomistic Simulation

Grigoriev,

Sulimov,

Tikhonravov

2024

Coatings

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An atomistic simulation of silicon dioxide thin films deposited using oxide targets is performed. The influence of the oxide target on the deposition process is taken into account by introducing O=Si=O molecules into the flow of particles moving from the target to the substrate. The fraction of these molecules varied from 0 to 50%. It was found that the presence of O=Si=O molecules leads to film densification during a normal deposition. With a low-energy deposition, the increase in density was twice as high as with a high-energy deposition. The absolute value of the compressive stress increased with an increasing fraction of O=Si=O molecules in the flow of deposited particles at a normal, high-energy deposition. The influence of O=Si=O molecules on the structure of the glancing angle deposited films depends on the deposition angle.

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Synthesis and properties of silicon dioxide films prepared by pulsed laser deposition using ceramic SiO2 target

Cited by 5 publications

References 20 publications

Comparison on Morphological and Optical Properties of TiO<SUB>2</SUB> Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Comparison on Morphological and Optical Properties of TiO<SUB>2</SUB> Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Modulation of optical focusing by using optimized zone plate structures

Silicon Dioxide Thin Films Deposited Using Oxide Targets: Results of Atomistic Simulation

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Synthesis and properties of silicon dioxide films prepared by pulsed laser deposition using ceramic SiO2 target

Cited by 5 publications

References 20 publications

Comparison on Morphological and Optical Properties of TiO&lt;SUB&gt;2&lt;/SUB&gt; Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Comparison on Morphological and Optical Properties of TiO&lt;SUB&gt;2&lt;/SUB&gt; Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Modulation of optical focusing by using optimized zone plate structures

Silicon Dioxide Thin Films Deposited Using Oxide Targets: Results of Atomistic Simulation

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Comparison on Morphological and Optical Properties of TiO<SUB>2</SUB> Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation

Comparison on Morphological and Optical Properties of TiO<SUB>2</SUB> Thin Films Grown by Single-Pulse and Multi-Pulse Laser Ablation