Synthesis and properties of epoxy-containing poly(cyclopropylstyrenes)

Guliev, K. G.; Ponomareva, G. Z.; Guliev, A. M.

doi:10.1134/s1560090407070068

Cited by 11 publications

(5 citation statements)

References 1 publication

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The photochemical investigations of the synthesized copolymers were carried out on methodology [10]. Owing to the availability of groups strongly absorbing the light energy (cyclopropane, chlorine, carbonyl), the synthesized copolymers are photosensitive and in action by UV irradiation are subjected to photochemical conversions leading to the formation of net structures.…”

Section: Resultsmentioning

confidence: 99%

See 1 more Smart Citation

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

Sadygova¹

2022

AChJ

View full text Add to dashboard Cite

The radical copolymerization of (p-chlorophenoxycarbonyl)cyclopropyl styrene with styrene and methyl methacrylate has been carried out. New cyclopropane-containing copolymers have been obtained. It has been established that the synthesized copolymers due to peculiarities of their structure and polyfucntionality, namely with content of carbonyl and cyclopropane groups sensitive to UV irradiation in the macromolecule have photosensitivity. The constant values of relative activity of monomers have been determined and Q-e parameters on Alfrey and Price have been calculated. The copolymerization constants of this compound (r1) with styrene and methyl methacylate (r2), calculated on Fineman-Ross method are: r1 = 1.1 and1.05, but r2 = 0.56 and 0.48, respectively; Q and e parameters values: Q1 = 3.1 and 2.4, e1 = –1.4 and –0.8, respectively. The photochemical structuring has been investigated and it has been shown that the structuring process proceeds due to of cyclopropane ring opening and carbonyl group. The composition and structure of these copolymers have been established and their some characteristics (heat resistance, hardness, adhesive strength, water absorption) have been investigated. The structuring process has been also studied and it has been established that the synthesized copolymer has relatively high photosensitivity (50–55 cm2J-1)

show abstract

Section: Resultsmentioning

confidence: 99%

“…This explains the great interest of researchers to preparation of new types of photosensitive polymers for microelectronics [2][3][4][5][6][7][8]. We have solved this problem by polymerization of functionally substituted cyclopropyl styrenes [9][10][11].…”

Section: Introductionmentioning

confidence: 99%

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

Sadygova¹

2022

AChJ

View full text Add to dashboard Cite

show abstract

“…The photochemical studies of the synthesized copolymers were performed according to [10]. Under the action of UV radiation, the copolymers undergo photochemical transformations leading to the formation of cyclic structures.…”

Section: Resultsmentioning

confidence: 99%

“…The route to the new materials is synthesis and polymerization of functionally substituted cyclopropylstyrenes [9][10][11][12].…”

mentioning

confidence: 99%

Copolymerization of (p-Vinylphenyl)cyclopropylmethyl cinnamate with styrene

et al. 2014

Self Cite

View full text Add to dashboard Cite

Radical copolymerization of (p-vinylphenyl)cyclopropylmethyl cinnamate with styrene was studied. A new cyclopropane-containing photosensitive copolymer was prepared. The composition and structure of the synthesized copolymer and the relative activity constants of the monomers were determined, and the Q-e parameters were calculated. The dependence of the photosensitivity on the copolymer composition was revealed.

show abstract

“…. These radicals initiate the copolymerization, which consists of the following elementary steps [9]: initiation to give intermediate cyclopropylcarbinyl radicals rearrangement of these radicals into allylcarbinyl radicals and chain propagation on allylcarbinyl radicals, involving the donor3acceptor complexes:…”

mentioning

confidence: 99%

Synthesis and Properties of Functionally Substituted Unsaturated Polysulfones

2005

Self Cite

View full text Add to dashboard Cite

High-temperature copolymerization of ethyl esters of vinyl-or isopropenylcyclopropanecarboxylic acids with SO 2 was studied as a route to functionally substituted unsaturated polysulfones. The composition, structure, and some properties of the polysulfones obtained were studied. The copolymerization mechanism was considered.Copolymers of olefins with SO 2 , polysulfones (PSs), show much promise for practice [133]. In particular, they can be used as plastics, materials for concentrating sulfuric acid solutions [1], and coatings for fabrics, paper, and wood [2]. Polysulfone materials are used for insulation and soundproofing. Polysulfones prepared from SO 2 and higher olefins improve the viscosity index of hydrocarbon lubricants [3].

show abstract

Synthesis and properties of epoxy-containing poly(cyclopropylstyrenes)

Cited by 11 publications

References 1 publication

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

COPOLYMERS ON THE BASIS OF (p-CHLOROPHENOXYCARBONYL)-CYCLOPROPYL STYRENE WITH STYRENE AND METHYL METHACRYLATE

Copolymerization of (p-Vinylphenyl)cyclopropylmethyl cinnamate with styrene

Synthesis and Properties of Functionally Substituted Unsaturated Polysulfones

Contact Info

Product

Resources

About