Synthesis and optical characterization of amorphous carbon nitride thin films by hot filament assisted RF plasma CVD

Kundoo, S.; Chattopadhyay, Kalyan Kumar; Banerjee, Arghya Narayan; Nandy, Suman

doi:10.1016/s0042-207x(02)00561-4

Cited by 17 publications

(7 citation statements)

References 29 publications

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“…The decrease in I D /I G in the range of 200-400 C [ Fig. 4(a)] suggests an increasing ratio of sp 3 C Although the evolution of bonding states and Raman shifts with deposition temperature for the films deposited in the present work are fairly similar to those of the a-CN x films annealed at various temperatures [11,12] and the films prepared by RF plasma CVD [14], a slight difference can be found yet. N content of the latter remains greater than 5 at% as annealing at high temperature, for example above 650 C, and the rearrangement and loosening of the film's microstructure are confirmed [12], but no N content is detected for the former deposited at 600 C, no N-sp 2 C bond is found, and the film is compact and smooth.…”

Section: Results and Discussion Composition And Microstructurementioning

confidence: 53%

“…As increasing the deposition temperature, the film undergoes the structural evolution from a-CN x to a-C. According to the Raman results from Kundoo et al [14], it is suggested that further increase in deposition temperature, such as above 800 C, will induce the appearance of crystalline graphite phase.…”

Section: Results and Discussion Composition And Microstructurementioning

confidence: 99%

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Effects of Temperature on Microstructure and Tribological Performance of a-CNx Films Prepared by Pulsed Laser Deposition

Zheng

Song

2010

Mat. & Manufacturing Processes

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Amorphous carbon nitride (a-CN x ) films were deposited onto silicon wafers at temperatures from RT up to 600 C by using pulsed laser deposition technique (PLD). The composition, morphology and microstructure of the CN x films were characterized by X-ray photoelectron spectrum (XPS), scanning electron microscopy (SEM) and Raman spectrum. The tribological performance of the films was investigated using a ball-on-disk tribometer. With increasing the deposition temperature ranging from RT to 400 C, the N content of films dropped from 36 at% to 22 at%, the ratio of N-sp 3 C bonds, hardness and friction coefficient of the film decreased. Further increase of deposition temperature led to the lack of nitrogen and the increasing degree of order in ringed sp 2 C=C bonds of the amorphous carbon film. The mechanical and tribological performances became worse. The film deposited at 300 C showed a low friction coefficient of 0.11 and a preferable wear resistance of 1 65 × 10 −7 mm 3 N −1 m −1 in humid air.

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Section: Results and Discussion Composition And Microstructurementioning

confidence: 53%

Section: Results and Discussion Composition And Microstructurementioning

confidence: 99%

Effects of Temperature on Microstructure and Tribological Performance of a-CNx Films Prepared by Pulsed Laser Deposition

Zheng

Song

2010

Mat. & Manufacturing Processes

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“…This peak is flanked by two key peaks at (2060 ± 7) and (2216 ± 5) cm −1 , associated with diffused HCN [32] and isolated and/or fused aromatic rings bonded to nitrile bonds, respectively. The presence of aligned vertical fibrous nanorod structures in these films shows that these bonds are crucial in forming these nanostructures.…”

Section: Resultsmentioning

confidence: 99%

“…The dominant peak in this region shifts to (2115 ± 10) cm −1 for the films deposited at N 2 :(N 2 + CH 4 ) ratios of 0.7 and 0.75, which is associated with isolated and/or fused aromatic rings bonded to isonitrile. This peak is flanked by two key peaks at (2060 ± 7) and (2216 ± 5) cm −1 , associated with diffused HCN [ 32 ] and isolated and/or fused aromatic rings bonded to nitrile bonds, respectively. The presence of aligned vertical fibrous nanorod structures in these films shows that these bonds are crucial in forming these nanostructures.…”

Section: Resultsmentioning

confidence: 99%

Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature

et al. 2017

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Nanostructured hydrogenated carbon nitride (CNx:H) thin films were synthesized on a crystal silicon substrate at low deposition temperature by radio-frequency plasma-enhanced chemical vapor deposition (PECVD). Methane and nitrogen were the precursor gases used in this deposition process. The effects of N2 to the total gas flow rate ratio on the formation of CNx:H nanostructures were investigated. Field-emission scanning electron microscopy (FESEM), Auger electron spectroscopy (AES), Raman scattering, and Fourier transform of infrared spectroscopies (FTIR) were used to characterize the films. The atomic nitrogen to carbon ratio and sp2 bonds in the film structure showed a strong influence on its growth rate, and its overall structure is strongly influenced by even small changes in the N2:(N2 + CH4) ratio. The formation of fibrous CNx:H nanorod structures occurs at ratios of 0.7 and 0.75, which also shows improved surface hydrophobic characteristic. Analysis showed that significant presence of isonitrile bonds in a more ordered film structure were important criteria contributing to the formation of vertically-aligned nanorods. The hydrophobicity of the CNx:H surface improved with the enhancement in the vertical alignment and uniformity in the distribution of the fibrous nanorod structures.

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“…Dengan erti kata lain, filem nipis a-CN x yang disediakan mengandungi matriks grafit tak tertib dengan sebahagian kandungan sp 3 -C (Yap et al 1998). Selain itu, puncak D yang lebar menunjukkan struktur amorfus dalam filem (Kundoo et al 2003). Manakala Jalur G muncul daripada pelbagai struktur ikatan sp 2 seperti rantaian olefinic dan gelang bergrafit yang berkaitan dengan getaran ikatan regangan bagi semua tapak sp 2 .…”

Section: Kaedah Uji Kajiunclassified

Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

Aziz

Awang²

2017

JSM

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Synthesis and optical characterization of amorphous carbon nitride thin films by hot filament assisted RF plasma CVD

Cited by 17 publications

References 29 publications

Effects of Temperature on Microstructure and Tribological Performance of a-CNx Films Prepared by Pulsed Laser Deposition

Effects of Temperature on Microstructure and Tribological Performance of a-CNx Films Prepared by Pulsed Laser Deposition

Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature

Kesan Kuasa Frekuensi Radio terhadap Komposisi Ikatan Kimia Filem Nipis a-CNx sebagai Pengesan Kelembapan

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