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2014
DOI: 10.1039/c4ra00073k
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Synthesis and formation mechanism of twinned SiC nanowires made by a catalyst-free thermal chemical vapour deposition method

Abstract: Twinned SiC nanowires were prepared on a silicon wafer by a simple catalyst-free thermal chemical vapour deposition (CVD) method.

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Cited by 24 publications
(11 citation statements)
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“…In this experiment, when maintaining at 1200°C, Si reacts with the limited amount of oxygen remaining in the air in the furnace chamber to form a small amount of solid SiO 2 by the reaction (). At the same time, gaseous SiO is generated by a solid‐solid reaction between Si and SiO 2 (reaction ). The gas phase produced by the raw materials is continuously diffused into the Si/Au eutectic alloy clusters to form the Si‐Au‐N‐O liquid droplets.…”
Section: Resultsmentioning
confidence: 99%
“…In this experiment, when maintaining at 1200°C, Si reacts with the limited amount of oxygen remaining in the air in the furnace chamber to form a small amount of solid SiO 2 by the reaction (). At the same time, gaseous SiO is generated by a solid‐solid reaction between Si and SiO 2 (reaction ). The gas phase produced by the raw materials is continuously diffused into the Si/Au eutectic alloy clusters to form the Si‐Au‐N‐O liquid droplets.…”
Section: Resultsmentioning
confidence: 99%
“…The formation mechanism of SiCNFs has been proposed in the previous reported. [37][38][39] Combined mechanism with experimental results, the V-S formation process could be discussed by Fig. 4.…”
Section: Preparation and Characterization Of The Supporting Scaffoldmentioning
confidence: 91%
“…[93,94] To overcome these daunting challenges, a considerable number of studies have been devoted to establishing new strategies for the catalyst-free synthesis of wide bandgap semiconductor nanowires. These catalyst-free routes are based on both vapor-liquid-solid and vapor-solid mechanisms employing a wide range of synthesis techniques, such as CVD, [95][96][97][98][99] molecular beam epitaxy (MBE), [100][101][102][103][104][105] arc discharge processes, [106,107] carbothermal reduction, [108,109] thermal evaporation, [110,111] and oxide-assisted methods. [62,112] Among them, CVD and MBEbased growth methods are considered as the most frequently used techniques to produce high-quality crystalline nanowires of WBG semiconductor materials, especially SiC, diamond, and group III-nitride.…”
Section: Synthesis and Growth Of Bottom-up Nanowiresmentioning
confidence: 99%