Synthesis and Evaluation of Pure-Silica-Zeolite BEA as Low Dielectric Constant Material for Microprocessors

Abstract

Pure-silica-zeolite (PSZ) BEA film was prepared on stainless steel substrates by in situ crystallization at 130 °C for 14 days using a gel composition of 0.6:0.6:1:9.8 (TEA)OH−HF−SiO2−H2O. The film is polycrystalline, continuous, and about 15 μm thick. The film was characterized by X-ray diffraction (XRD), thermogravimetric analysis (TGA), inductively coupled plasma−atomic emission spectrometry (ICP−AES), Fourier transform infrared spectroscopy (FT-IR), and scanning electron microscopy (SEM). The as-synthesized film was also measured for the first time for dielectric constant (k), and a k value of 2.3 was obtained.

Controlled epitaxial growth of mesoporous silica/gold nanorod nanolollipops and nanodumb-bells

“…(1), one sees that the λ max of the MSGNRs should increase when the effective dielectric constant of the medium increases, since the value of R is fixed at 6 (GNR-2). Previous studies of the dielectric properties of MSGNRs have shown the dielectric constant of the silica (ε = 4) to be larger than the dielectric constant of CTAB layer (ε = 2.1), [28][29][30] indicating the completely silica-coated θ-MSGNRs are expected to exhibit longer λ max than the partial silica-coated ϕ-MSGNRs and β-MSGNRs. Consequently, depending upon the extent and density of the silica-coating coverage on MSGNRs, the effective dielectric constants of the medium should be θ-MSGNRs > ϕ-MSGNRs: β-MSGNRs (1:3) > ϕ-MSGNRs: β-MSGNRs (1:1); in other words, the refractive index of the materials should be θ-MSGNRs < ϕ-MSGNRs: β-MSGNRs (1:3) < ϕ-MSGNRs: β-MSGNRs (1:1).…”

“…The gold seed solution should be used in 2 days after being synthesized. After formation of GNR seed solution, it was then gently stirred for 10 min while being placed in a water bath at [28][29][30] • C, to ensure the removal of excess NaBH 4 . GNR growth media was prepared by adding 0.2M CTAB (50 ml) to 2 ml (for GNR AR ∼ 4) and 4 ml (for GNR AR ∼ 6) aliquots of 4 mM AgNO 3 , followed by addition of 1 mM HAuCl 4 (50 ml) with gentle mixing of each specimen-while maintaining a temperature of 28-30…”

Synthesis And Characterization Of Pure-Silica- Zeolite-Beta Membrane

“…Although the aluminosilicate zeolites are hydrophilic, pure silica zeolites are hydrophobic which could help to reduce water adsorption [4]. 'Pure silica zeolites' are silica zeolites having only silicon and virtually no aluminium.…”

“…Therefore, thin films for use as dielectric in semiconductor and other devices are prepared from silica zeolites, preferably pure silica zeolites such as pure-silica MFI [4]. The films have low k values, generally below about 2.7, ranging downwards to k values below 2.2.…”

“…The films have low k values, generally below about 2.7, ranging downwards to k values below 2.2. The films have relatively uniform pore distribution, good mechanical strength and adhesion, are relatively little affected by moisture, and are thermally stable [ 3,4 ].…”