2011
DOI: 10.1016/j.matlet.2011.06.029
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Synthesis and characterization of undoped and TM (Co, Mn) doped ZnO nanoparticles

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Cited by 47 publications
(12 citation statements)
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“…ZnO is a semiconductor with a wide band gap (3.3 eV) and a large exciton binding energy and is abundant in nature and environmentally friendly; these characteristics make this material attractive for many applications, including solar cells, optical coatings, photocatalysts, and electrical devices [1]. Researches have shown that ZnO exhibits better photocatalytic efficiency than TiO 2 for the removal of organic compounds in water matrices [2].…”
Section: Introductionmentioning
confidence: 99%
“…ZnO is a semiconductor with a wide band gap (3.3 eV) and a large exciton binding energy and is abundant in nature and environmentally friendly; these characteristics make this material attractive for many applications, including solar cells, optical coatings, photocatalysts, and electrical devices [1]. Researches have shown that ZnO exhibits better photocatalytic efficiency than TiO 2 for the removal of organic compounds in water matrices [2].…”
Section: Introductionmentioning
confidence: 99%
“…Due to Mn doping, the diameter and length of the ZnO nanorods increases slightly compared to the undoped one. 27,30 From the EDAX spectrum (Fig. 2(c)), we have observed that the as grown Zn 1−x Mn x O nanorods contain a small amount of Mn (nearly 5%) with Zn and O.…”
Section: B Surface Topographymentioning
confidence: 97%
“…There are several methods that have been used for the preparation of ZnO NPs which include physical methods and wet chemistry to solid-phase systems. However, the physical and chemical methods such as evaporation plasma [10], anodization [11,12], spin on methods [13,14], sputtering [15], ion-assisted deposition [16], reactive ion plating [17], laser ablation [18], filtered arc deposition [19] and atomic layer epitaxy [20] employed for the preparation of ZnO NPs in previous articles have been reported to require very expensive equipments, complex process controls and stringent reaction conditions. Additionally, these methods are responsible for the host of many problems such as generation of hazardous by-products, the use of toxic and flammable solvents, difficult controlling of morphology, very substrate dependent and require high vacuum temperature.…”
Section: Introductionmentioning
confidence: 99%