“…There are several methods that have been used for the preparation of ZnO NPs which include physical methods and wet chemistry to solid-phase systems. However, the physical and chemical methods such as evaporation plasma [10], anodization [11,12], spin on methods [13,14], sputtering [15], ion-assisted deposition [16], reactive ion plating [17], laser ablation [18], filtered arc deposition [19] and atomic layer epitaxy [20] employed for the preparation of ZnO NPs in previous articles have been reported to require very expensive equipments, complex process controls and stringent reaction conditions. Additionally, these methods are responsible for the host of many problems such as generation of hazardous by-products, the use of toxic and flammable solvents, difficult controlling of morphology, very substrate dependent and require high vacuum temperature.…”