Synthesis and characterization of TiO₂ thin films on organic self-assembled monolayers: Part I. Film formation from aqueous solutions

Abstract

Self-assembled monolayers (SAMs) bearing sulfonate (-SO3H) surface functional groups, on single-crystal Si wafers, were used as substrates for the deposition of TiO2 thin films from aqueous solutions. Polycrystalline TiO2 thin films over 50 nm thick formed in 2 h by hydrolysis of TiCl4 in aqueous HCI solutions at 80 °C. The films were pore-free, showed excellent adherence and uniformity, and consisted of anatase crystallites 2–4 nm in diameter. Annealing at temperatures up to 600 °C caused coarsening of the anatase grains, but no loss of adherence or structural integrity.

Site selective micro-patterned rutile TiO2 film through a seed layer deposition

“…Titanium dioxide (TiO 2 ) has many useful electrical and optical properties, such as a high refractive index, high dielectrical permittivity, semiconductivity, excellent transmittance of visible light, and so forth, which make TiO 2 films useful in many fields, like microelectonics [2], optical cells [3], solar energy conversion [4], efficient catalyst [5]. Accordingly, fabrication of thin films and micropatterns of TiO 2 has been attempted by various methods in the past decades [6][7][8][9][10][11][12][13][14][15][16].…”

Photoelectrochemical characterisation of thermal and particulate titanium dioxide electrodes

“…they are made of TiO 2 nanoparticles further aggregated to micrometer-sized particles during thermal annealing. The catalyst layer is either synthesised in the laboratory by a variety of methods [8][9][10][11][12][13][14][15][16][17][18] or, alternatively, prepared from commercial Degussa P-25 TiO 2 suspensions by dip-coating, spraying or sedimentation techniques [19][20][21].…”

Structural characterization of ZrO2 thin films produced via self-assembled monolayer-mediated deposition from aqueous dispersions

“…This method was introduced by Bunker et al for the deposition of iron and calcium oxide films (9), and has been extended to form films of e.g. TiO 2 (10)(11)(12)(13)(14), ZrO 2 (13)(14)(15)(16), ZrO 2 -Y 2 O 3 (15) and Y 2 O 3 (17) on Si single crystals. The functional groups are the terminating groups of a self-assembled monolayer (SAM), i.e.…”