Synthesis and characterization of thin-film molybdenum nitrides

The impact of nitrogen content and vacancies on structure and mechanical properties of Mo–N thin films

“…Contrary to the description of ordered Mo-N phases by Troitskaya and Pinsker, 16 our c 0 -MoN x phase contains vacancies only at the N-sublattice. Actually, a corresponding model for our c 0 -MoN x phase (according to Maoujoud et al 47 ) was already proposed earlier by Pinsker and Kaverin, 48 but without discussing the ordering. Here, we want to mention that XRD investigations of the powdered coating material (removed from their substrates) do not present superstructure reflexes, even for the coating prepared with p N 2 /p T ¼ 0.69.…”

Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties

“…The solubility of nitrogen in molybdenum metal is rather low [22,44]. Direct reactions of the metal with nitrogen gas employ very high temperatures to cleave the strong N-N triple bond.…”

“…Maoujoud et al [44] have determined the crystal structures of molybdenum nitride films made by the reaction of ammonia with molybdenum thin films deposited on MgO substrates at temperatures ranging from 573 to1223 K. The Mo thin films are obtained by thermal evaporation. The film thickness lies between 60 and 120 nm.…”

Formation of a Mo2N skin layer in columnar-structural Mo films using NH3 plasma nitridation as the Se diffusion-barrier layer

“…The use of NH 3 could lower the nitridation temperature of Mo due to the reactivity of NH 3 at relatively low temperature, and Mo 2 N phase could be formed in the low-temperature condition [24]. However, a low-temperature process around 500°C requires a long treatment time to acquire desired properties [24]. This paper proposes an easy and quick technique to form a Sebarrier layer on a Mo electrode.…”

“…However, the solubility of N in Mo is rather low, and a high temperature is typically required for the direct nitridation of Mo with N 2 gas due to strong N-N triple bonds [23,24]. The use of NH 3 could lower the nitridation temperature of Mo due to the reactivity of NH 3 at relatively low temperature, and Mo 2 N phase could be formed in the low-temperature condition [24]. However, a low-temperature process around 500°C requires a long treatment time to acquire desired properties [24].…”