Synthesis and characterization of some carbon based nanostructures

Ciupină, V.; Morjan, I.; Alexandrescu, R.; Dumitrache, Florian; Prodan, G.; Lungu, C.P.; Vladoiu, R.; Mustaţǎ, I.; Zarovschi, V.; Sullivan, J. L.; Saied, S.O.; Vasile, Eugeniu; Oancea-Stanescu, Iuliana; Prodan, M.; Manole, D.; Mandes, Aurelia; Dinca, Virginia; Contulov, M.

doi:10.1117/12.859456

Cited by 2 publications

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“…However, when two crucibles are fixed on a turntable, like in Figure 7, it is possible to deposit multilayers without breaking the vacuum in the TVA system. The arrangement is suitable for deposition of the nanostructured materials with special resistive magnetic properties [44][45][46]. For that purpose, the Cu and Co thin films were grown by the TVA method in this arrangement.…”

Section: One Electron Gun and Two/three Cruciblesmentioning

confidence: 99%

“…Crystalline inclusions embedded into the amorphous carbon films were revealed in cases of by TVA and MS deposited samples, which indicate possible applications in wear-protective coatings for magnetic devices. Another possible application of the crystalline carbon thin films could be in anticorrosive coatings for magnetic devices [112].…”

Section: Outstanding Properties Of the Deposited Dlc Thin Filmsmentioning

confidence: 99%

“…Multilayer structures of Cu-Co-Cu-Fe deposited by TVA were studied in [44,45]. The structure of the thin films contained 16 layers (totaling 180 nm), structured in 4 sets of 4 successive layers: Cu, Co, Cu, and Fe.…”

Section: Materials Having Gmr/tmr Propertiesmentioning

confidence: 99%

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Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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Section: One Electron Gun and Two/three Cruciblesmentioning

confidence: 99%

Section: Outstanding Properties Of the Deposited Dlc Thin Filmsmentioning

confidence: 99%

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Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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“…Typical carbon based nanostructures methodologies involving different routes are presented: thin films vapor deposition procedures, iron-carbon nanostructures laser pyrolysis, catalyzed iron carbon nanoparticles, nanotubes, etc [1].…”

Section: Introductionmentioning

confidence: 99%

Electron microscopy characterization of some carbon based nanostructures with application in divertors coatings from fusion reactor

Ciupină

Morjan

Lungu

et al. 2011

Nanostructured Thin Films IV

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Nanostructured carbon materials have increasingly attracted the interest of the scientific community, because of their fascinating physical properties and potential applications in high-tech devices. In the current ITER design, the tiles made of carbon fiber composites (CFCs) are foreseen for the strike point zone and tungsten (W) for other parts of the divertor region. This choice is a compromise based mainly on experience with individual materials in many different tokamaks. Also Beryllium is the candidate material for the First Wall in ITER.In order to prepare nanostructured carbon-tungsten nanocomposite for the divertor part in fusion applications, the original method thermionic vacuum arc (TVA) was used in two electronic guns configuration. One of the main advantages of this technology is the bombardment of the growing thin film just by the ions of the depositing film.The nanostructured C-W and C-Be films were characterized by Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Atomic Force Microscopy (AFM). The C-W films were identified as a nanocrystals complex (5 nm average diameter) surrounded by amorphous structures with a strong graphitization tendency, allowing the creating of adherent and wear resistant films. The C-Be films are polycrystalline with mean grain size about 15 nm. The friction coefficients (0.15 -0.35) of the C-W coatings was decreased more than 3-5 times in comparison with the uncoated substrates proving excellent tribological properties. C-W nanocomposites coatings were designed to have excellent tribological properties while the structure is composed by nanocrystals complex surrounded by amorphous structures with a strong graphitization tendency, allowing the creating of adherent and wear resistant films.

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Synthesis and characterization of some carbon based nanostructures

Cited by 2 publications

References 1 publication

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

Electron microscopy characterization of some carbon based nanostructures with application in divertors coatings from fusion reactor

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