Synthesis and Characterization of Self-Assembled ZnO Nanoparticles Embedded Within a SiO2 Matrix Deposited on (111) p-Type Silicon By Reactive RF Sputtering Using Metallic Zinc Target As Precursor

Avila-Meza, M. F.; Zelaya-Ángel, O.; Gallardo-Hernández, S.; Fernández-Muñoz, J. L.; Alfaro-Flores, D. R.; Meléndez‐Lira, M.

doi:10.1007/s11664-018-6586-x

Cited by 2 publications

(1 citation statement)

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“…Also, ZnO nanoparticles, produced by chemical methods, frequently have residues that would affect negatively its performance. In this work it is reported an effect observed when reactive RF sputtering is employed to deposit SiO 2 /metallic Zn/SiO 2 on quartz and p-type silicon substrates; the valleys in the first rough SiO 2 layer acted as nucleation centers to the formation of self-assembled ZnO nanoparticles produced due to the oxidation process associated with the reactive atmosphere 14 . Samples are characterized by X-ray diffraction, electron transmission microscopy, UV-Vis and Raman spectroscopies.…”

Section: Introductionmentioning

confidence: 98%

Modification of the Crystalline Structure of ZnO Nanoparticles Embedded Within a SiO2 Matrix due to Thermal Stress Effects

et al. 2019

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Self-assembled nanocrystals of ZnO were embedded within a SiO 2 matrix by a sequential deposit using reactive R.F. sputtering. The ZnO nanoparticles (NP's) were obtained by depositing a very thin layer (~20 nm) of Zn on the bottom of the valleys of a first SiO 2 rough surface and then covered by another SiO 2 layer at 500 °C. The stress produced, due to the cooling process, by the SiO 2 matrix on the ZnO NP's generates an unusual crystalline phase of ZnO. The crystal structure was determined by means of X ray diffraction patterns. The ZnO + SiO 2 composite shows a transmittance higher than 80 % for wavelengths > 450 nm. Optical absorption allows to reveal the character and value of the optical band gap. Vibrational modes of the material were determined by Raman spectroscopy.

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Section: Introductionmentioning

confidence: 98%