Synthesis and Characterization of PMMA Adherent ZnS thin Films by Spin Coating Method

Sabitha, C.; Joe, I. Hubert

doi:10.1016/j.matpr.2015.06.035

Cited by 4 publications

(3 citation statements)

References 19 publications

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“…The flatness difference between the two layers is caused by the polystyrene solution used in this study is in the form of powder which has been dissolved with toluene as described in the research method, while methyl methacrylate from the beginning has been in the form of a solution with an assay of 99% and a density of 0.942-0.944 at a temperature of 20 o C / 4 o C, not a powder like polystyrene. This different state of solution is what causes the difference in flatness in the layers [30]. Figure 5 (a) shows that that the polystyrene layer formed is uneven so that the surface of the ITO glass has not been completely coated, this shows that the process of forming the layer is less than perfect.…”

Section: Resultsmentioning

confidence: 99%

“…The surface to be coated is a non-conductor surface. After ITO glass was coated with polystyrene and methyl methacrylate and then heated on a hot plate at a temperature of 80 0 C for 15 minutes [30]. Characterization of polystyrene and methyl methacrylate layers is done by measuring the thickness of each layer, transmission and absorption values, and observation of the surface of the coating.…”

Section: Methodsmentioning

confidence: 99%

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Fabrication of Non Reflecting Film Based on Polystyrene and Methyl Methacrylate Using Spin Coating to Increase a Light Transmission on Ito Glass

et al. 2020

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Thin films are developed for multi-purposes, such as optical waveguides, corrosion resistant coating, car tinting, and glass coatings. Each thin film is created and designed with a specific purpose and function. The purpose of this research was to fabrication anti-reflective films on glass Indium Tin Oxide (ITO) usually used as an electrode in Dye-sensitized Solar Cell (DSSC). In this research, the material used involved solution 100.12 g/mol Methyl Methacrylate (MMA) and 3% Polystyrene(PS) with a spin coating method. In this study, polystyrene and methyl methacrylate solution dripped on ITO glass was then rotated at 1000, 1500, 2000 and 2500 rpm. This study shows that polystyrene and methyl methacrylate materials can be used as an anti-reflection coating on the ITO substrate by a spin coating method. The methyl methacrylate material is good for anti-reflection coating at 400-475 nm wavelength region, while the polystyrene material is good for 475-700 nm wavelength. The addition of a 3% polystyrene coating on ITO glass can increase light transmission at a wavelength of 475-700 nm by 1.14% when compared to ITO glass without a polystyrene coating. The highest light transmission of 90.11% occurs at a wavelength of 420 nm when the ITO glass is coated with methyl methacrylate.

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Section: Resultsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Fabrication of Non Reflecting Film Based on Polystyrene and Methyl Methacrylate Using Spin Coating to Increase a Light Transmission on Ito Glass

et al. 2020

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“…These methods include magnetron sputtering, pulsed laser deposition (PLD), metal-organic chemical vapor deposition (MOCVD), molecular beam epitaxy (MBE), thermal evaporation, electrodeposition, atomic layer deposition (ALD), spray pyrolysis, spin coating, and chemical bath deposition. [13][14][15][16][17][18][19][20][21][22][23][24] Among these methods, magnetron sputter-ing has high efficiency and causes no pollution. Films prepared by magnetron sputtering exhibit good interfacial adhesion with the substrate, high compactness, and can be prepared on a large-area substrate.…”

Section: Introductionmentioning

confidence: 99%

Influence of low-temperature sulfidation on the structure of ZnS thin films

et al. 2019

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ZnS thin films were prepared by sulfuring zinc thin films at different sulfuration temperatures. The crystal structure, surface morphology, defects, and optical properties of the thin films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), positron annihilation Doppler broadening, and UV-Vis spectrophotometer, respectively. It was found that the (200)-plane preferred orientation of the ZnS thin films changed to (111)-plane with increasing sulfidation temperature. Moreover, a number of large holes were generated at 420 • C and eliminated at 440 • C. The concentration of defects was lowest when the sulfuration temperature was 440 • C. The optical transmission of all samples was maintained at 60%-80% in the wavelength range of 400 nm-800 nm, and the band energy of the ZnS thin films was approximately 3.5 eV for all treatment temperatures except 430 • C.

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