Synthesis and characterization of perfectly alternating polyorganosiloxane—Polyarylester and —Poly(aryl formal) block copolymers

Brandt, Patricia J. Andolino; Elsbernd, Cheryl L. Senger; Patel, Nilesh K.; York, G. A.; McGrath, James E.

doi:10.1016/0032-3861(90)90372-6

Cited by 25 publications

(5 citation statements)

References 4 publications

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“…The catalyst tetramethylammonium siloxanolate (TMAS) was prepared from 4.31 g (0.0233 mol) of tetramethylammonium hydroxide pentahydrate and 32.11 g (0.1050 mol) of D4 in a three-neck flask with magnetic stirring at 62-66°C under a strong argon stream for about 48 h. [15][16][17] The argon stream was bubbled through the reaction solution to remove the water completely. After the completion of the dehydration, a viscous translucent siloxanolate catalyst was obtained and stored in a refrigerator before the synthesis of APPS oligomer.…”

Section: Synthesis Of Apps Oligomersmentioning

confidence: 99%

Effects of the solubility parameter of polyimides and the segment length of siloxane block on the morphology and properties of poly(imide siloxane)

Jwo¹,

Whang²,

Liaw³

1999

J. Appl. Polym. Sci.

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The dependence of morphology of the poly(imide siloxane)s (PISs) on the solubility parameter of unmodified polyimides and the molecular weight and content of ␣,-bis(3-aminopropyl) polydimethylsiloxane (APPS) has been studied. The effect of the morphology on the mechanical properties is also under investigation. The domain formation in the PISs with the APPS molecular weight M n ϭ 507 g/mol is not found until the mol ratio of APPS/PIS Ն 0.5% in the pyromellitic dianhydride/p-phenylene diamine (PMDA/p-PDA)-based PISs, and at a mol ratio Ն 2.7% in the 3,3Ј,4,4Ј-benzophenone tetracarboxylic dianhydride/2,2Ј-bis[4-(3-aminophenoxy) phenyl] sulfone (BTDA/m-BAPS)-based PISs. As the APPS M n ϭ 715 g/mol, the critical APPS concentrations of the domain formation in both types of PISs are equal to 0.1 and 1.1%, respectively. The critical concentration is equal to 0.6% in the BTDA/m-BAPS-based PIS film with the APPS M n ϭ 996 g/mol. The isolated siloxane-rich phase in the BTDA/m-BAPS-based PISs becomes a continuous phase as the mol ratio of APPS/PIS Ն 7.7, 10.0, and 16.6% as the APPS M n ϭ 996, 715, and 507 g/mol, respectively. Dynamic Mechanical Analysis (DMA) shows two T g s in the PIS films having phase separation: one at Ϫ118 ϳ -115°C, being the siloxane-rich phase, the other at 181-244°C, being the aromatic imide-rich phase. The SEM micrographs show a significant deformation on the fractured surfaces of the BTDA/m-BAPS-based PIS films with a continuous siloxane-rich phase. This phenomenon of plastic deformation is also observed in the tensile tests at Ϫ118°C and at room temperature. The highest elongation in the PIS films is found at the critical siloxane content of the continuous siloxane-rich phase formation.

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Section: Synthesis Of Apps Oligomersmentioning

confidence: 99%

Effects of the solubility parameter of polyimides and the segment length of siloxane block on the morphology and properties of poly(imide siloxane)

Jwo¹,

Whang²,

Liaw³

1999

J. Appl. Polym. Sci.

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“…23 The absorption bands at 1028 and 1094 cm À1 corresponding to the SiAOASi stretching of the APPS were observed for both PIS hybrid films. However, TiO 2 stretching bands 1,25,[24][25][26] in the range of 400 to 850 cm À1 cannot be distinguished in hybrid films. Figures 2 and 3 showed the TGA results of the hybrid films with various TiO 2 contents and the corresponding decomposition temperature (T d ) at 5% weight loss of each sample was listed in Table II.…”

Section: Ftirmentioning

confidence: 99%

Effect of TiO₂ on thermal and adhesive characteristics of poly(imide siloxane)/TiO₂ hybrid films

Tseng

Whang

et al. 2011

J of Applied Polymer Sci

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A novel poly(imide siloxane)/titania (PIS/ TiO 2 ) hybrid film was fabricated by sol-gel process via in situ formation of TiO 2 within PIS matrix. Poly(amic acid siloxane) (PAAS) was prepared from 4,4 0 -oxydiphthalic anhydride, 2,2-bis [4-(4-aminophenoxy) phenyl] propane, and a,x-bis(3-aminopropyl)polydimethylsiloxane (APPS). Chelating agent, acetylacetone, and catalyst-free polymerization were used to reduce the rate of hydrolysis of titanium alkoxide in the PAAS. X-ray photoelectron spectroscopy data showed that the presence of APPS promotes the Ti surface composition of PIS/TiO 2 hybrid film. The effects of TiO 2 and APPS contents on the characteristics of surface, thermostability, coefficient of thermal expansion (CTE), and the strength of adhesion were investigated. The presence of TiO 2 on the surface of the hybrid films enhanced the adhesive strength at the interface of PIS/TiO 2 hybrid film and copper foil. When more TiO 2 was incorporated into the PIS matrix, the PIS/TiO 2 hybrid film exhibited lower CTE while retaining favorable mechanical and thermal properties.

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“…Polyformals of bisphenols and dichloromethane were prepared by polyetherification in dimethylsulfoxide at 80 °C (22). The poly(formal)s of bisphenol-A, tetramethylbisphenol-A (TMBA), and their copolymers were generated by this method.…”

Section: Poly(formal)smentioning

confidence: 99%

A Survey of Some Recent Advances in Step-Growth Polymerization

Labadie

Hedrick

Ueda

1996

Step-Growth Polymers for High-Performance Materials

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The field of step-growth polymers encompasses many polymer structures and polymerization reaction types. This chapter attempts to cover topics in step--growth polymerization outside of the areas reviewed in the other introductory chapters in this book, i.e., poly(aryl ethers), dendritic polymers, high--temperature polymers and transition-metal catalyzed polymerizations. Polyamides, polyesters, polycarbonates, poly(phenylene sulfides) and other important polymer systems are addressed. The chapter is not a comprehensive review but rather an overview of some of the more interesting recent research results reported for these step-growth polymers, including new polymerization chemistries and mechanistic studies. Aromatic PolyamidesAromatic polyamides (aramids) are important in the commercial fibers industry because of their high tensile strength and good flame resistance. The demand for these materials is increasing as new applications are found. One example is their use in composites where high-use temperatures, light weight, chemical resistance, and dimensional stability are crucial.The most widely employed synthetic route to aramids is based on the polycondensation of dicarboxylic acids with diamines in the presence of condensing agents. Good reviews on the synthesis of aramids have recently appeared (1-3). Recently, promising alternative synthetic routes to aramids have been reported and are described herein.These include the polycondensation of N-silylated diamines with diacid chlorides, the addition--elimination reaction of dicarboxylic acids with diisocyanates, and the palladium-catalyzed carbonylation polymerization of aromatic dibromides, aromatic diamines and carbon monoxide.The synthesis of aramids from N-silylated amines has been employed because N-silylated aromatic amines show higher reactivity relative to the parent diamines and the resulting trialkylsilyl halide does not lower the reactivity of unreacted amine functionality as is the case with amine protonation

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Synthesis and characterization of perfectly alternating polyorganosiloxane—Polyarylester and —Poly(aryl formal) block copolymers

Cited by 25 publications

References 4 publications

Effects of the solubility parameter of polyimides and the segment length of siloxane block on the morphology and properties of poly(imide siloxane)

Effects of the solubility parameter of polyimides and the segment length of siloxane block on the morphology and properties of poly(imide siloxane)

Effect of TiO₂ on thermal and adhesive characteristics of poly(imide siloxane)/TiO₂ hybrid films

A Survey of Some Recent Advances in Step-Growth Polymerization

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Synthesis and characterization of perfectly alternating polyorganosiloxane—Polyarylester and —Poly(aryl formal) block copolymers

Cited by 25 publications

References 4 publications

Effects of the solubility parameter of polyimides and the segment length of siloxane block on the morphology and properties of poly(imide siloxane)

Effects of the solubility parameter of polyimides and the segment length of siloxane block on the morphology and properties of poly(imide siloxane)

Effect of TiO2 on thermal and adhesive characteristics of poly(imide siloxane)/TiO2 hybrid films

A Survey of Some Recent Advances in Step-Growth Polymerization

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Effect of TiO₂ on thermal and adhesive characteristics of poly(imide siloxane)/TiO₂ hybrid films