Synthesis and characterization of p-type transparent conducting CuAlO2 thin film by DC sputtering

Rapid synthesis and electrical transition in p-type delafossite CuAlO2

“…These measurements were on thin films and employing DC measurements technique. Less work has been done on high temperature measurements, although some researchers 15,31,34 attempted to measure in the temperature range (in°C) of 302 ≥ T ≥ RT . These were thin films too and used DC measurements.…”

“…The conductivity is highly anisotropic due to its structure 12 . CAO thin films are generally prepared by pulsed laser deposition (PLD) 2 , spray pyrolysis 13 , chemical vapour deposition 14 , sputtering [15][16][17][18] . TCO thin films for optoelectronics devices such as transparent solar cells and flat panel displays are commercially deposited using RF sputtering because of its capability of producing high purity thin films at lower temperatures.…”

Electro-optical properties of all-oxide p-CuAlO2/n-ZnO: Al transparent heterojunction thin film diode fabricated on glass substrate

“…3. Electrical properties of the individual layers have been studied in detail and represented in our previous literature [16][17][18][19][20]. A comparative study of different electrooptical properties of the individual films is furnished in Table-1.…”

“…A schematic flow-chart of the diode fabrication is furnished in Fig. 1 and details of the deposition conditions were also reported in our previous literature [17][18][19][20][21].…”

Helicon‐wave‐excited plasma sputtering deposition of CuAlO2 thin films

“…CuAlO 2 is also a candidate for use in transparent transistors, UV light emitting diodes, and solar cells composed of transparent p-n junction, since its direct bandgap energy has been reported to be ∼3.5 eV [4]. CuAlO 2 films have been deposited by a variety of methods, including RF magnetron sputtering [5,6], DC magnetron sputtering [7][8][9][10], chemical vapor deposition [11], pulsed laser deposition [1,12], and wet oxidation [13] techniques. The sputtering methods are most desirable because they can economically deposit large-area films with well-controlled compositions.…”