Synthesis and Characterization of Nanostructured a-C:H (Hydrogenated Amorphous Carbon) Thin Films by Gaseous Thermionic Vacuum Arc (G-TVA) Deposition Technique

Vladoiu, R.; Ciupină, V.; Contulov, M.; Dinca, Virginia; Mandes, Aurelia; Buršı́ková, Vilma

doi:10.1007/s11090-011-9344-x

Cited by 5 publications

(3 citation statements)

References 23 publications

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“…It was concluded, that the both methods could produce DLC films with a comparable hardness. In [59] and [60], the hydrogenated amorphous carbon layers (a-C:H) were deposited by G-TVA on silicon and glass substrates. The surface free energy and the mechanical properties of the films were investigated.…”

Section: Gaseous Thermionic Vacuum Arc (G-tva)mentioning

confidence: 99%

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Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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Section: Gaseous Thermionic Vacuum Arc (G-tva)mentioning

confidence: 99%

“…The a-C:H thin films with precise characteristics at the nanometric scale presents the work [51]. Smooth and pinhole-free a-C:H films were deposited by G-TVA and reported in [60]. The films exhibited good fracture toughness, wear resistance and good adhesion to silicon and carbon substrates.…”

Section: Biomedical Coatingsmentioning

confidence: 99%

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

et al. 2020

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“…The extension of thermionic vacuum arc technology to coatings using gases or evaporable liquids as in the case of gaseous thermionic vacuum arc (GTVA) instead of solid materials is of great interest especially for DLC growth. While in the TVA method the anode is solid-a carbon rod-being suitable for practically any solid material, the GTVA method enables the growth of ultrathin and ultrapure DLC coatings using CH 4 as gas precursor in vacuum conditions [18].…”

Section: Dlc Thin Filmsmentioning

confidence: 99%

DLC Thin Films and Carbon Nanocomposite Growth by Thermionic Vacuum Arc (TVA) Technology

Vladoiu¹,

Poroşnicu²,

Mandes³

et al. 2016

Diamond and Carbon Composites and Nanocomposites

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The aim of this chapter is to report the results on synthesis DLC thin films and carbon nanocomposites by the versatile nanofabrication method based on plasma entitled thermionic vacuum Arc TVA . TV" technology is based on the localized ignition of the arc plasma in vacuum conditions. "mong thin film coating methods by vacuum deposition techniques with high purity, low roughness, and good adhesion on the substrates, TVA is one of the major suitable methods to become a powerful coating technology. Two or three different TV" discharges can be ignited simultaneously in the same chamber for multi-material processing using TV" and separate power supplies. These TV" discharges are localized and do not interfere with each other. Simultaneous two or three TV" discharges were already used for the production of alloy/composite of various materials. This is due to the high versatility concerning the configuration of experimental arrangements, taking into account the number of electron guns, symmetry of the electrodes, relative position of the anode versus cathode, and also the huge opportunity to combine the materials to be deposited bi-and multi-layers, nanocomposites, or alloys in order to have specific applications. This chapter presents the comparative results concerning the surface-free energy information processing, the reflective index, the hardness, and the morphology to provide a coherent description of the diamond-like carbon films and carbon nanocomposites synthesized by thermionic vacuum arc TV" and related configurations where Me = "g, "l, Cu, Ni, and Ti: binary composites CMe, C-Si and ternary composites C+Si+Me . The results include reports on the distribution in size, surface, geometry, and dispersion of the nanosized constituents, tailoring and understanding the role of interfaces between structurally or chemically dissimilar phases on bulk properties, as well as the study of physical properties of nanocomposites structural, chemical, mechanical, tribological . The results presented

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Preparation and Characterization of Sulfurized Tungsten Doped Non-hydrogenated Diamond-Like Carbon Films

Liu

Yue

Wang

et al. 2015

Plasma Chem Plasma Process

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Synthesis and Characterization of Nanostructured a-C:H (Hydrogenated Amorphous Carbon) Thin Films by Gaseous Thermionic Vacuum Arc (G-TVA) Deposition Technique

Cited by 5 publications

References 23 publications

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications

DLC Thin Films and Carbon Nanocomposite Growth by Thermionic Vacuum Arc (TVA) Technology

Preparation and Characterization of Sulfurized Tungsten Doped Non-hydrogenated Diamond-Like Carbon Films

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