Synthesis and Characterization of Chemically Deposited Nickel Sulphide Thin Film Electrodes for Electrochemical Supercapacitor Application

Abstract

Nickel sulphide (NiS) thin films were synthesized on glass and stainless steel (SS) substrates using a simple chemical bath deposition route. The structural, surface morphology were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) respectively. The electrochemical capacitor performances were examined by using cyclic voltammetry, galvanostatic charge-discharge test and electrochemical impedance spectroscopy. In cyclic voltammetry (CV) studies, the NiS electrode exhibits the specific capacitance of 441 Fg-1 has been obtained in 2 M KOH solution at a scan rate 10 mVs-1 within the potential range 0 to 0.8 V vs. Ag/AgCl. In charge-discharge behaviors, the supercapacitive parameters such as specific energy (S.E.) and specific power (S.P.) are 10.1 Whkg −1 and 4.5 KWkg −1 respectively. Impedance spectroscopic analysis revealed that the ESR is 11 Ω in KOH electrolyte.

Effect of Deposition Time on the Properties of NiS Films Prepared by Chemical Bath Deposition

“…Anuar Kasim et al deposited NiS films on glass substrates using the CBD method and the influence of triethanolamine on the structural and morphological properties was studied (12) . Sonawane et al prepared NiS films on glass and stainless steel substrates using the CBD method at room temperature and investigated the electrochemical supercapacitor application (13) . Paresh Gaikar et al (14) prepared NiS thin films on titanium substrate with additive free by using the chemical bath deposition method for pseudocapacitor application, where the XRD pattern showed polycrystalline nature having a crystalline size of 19 nm.…”