1997
DOI: 10.1016/s0965-9773(97)00046-9
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Synthesis and characterization of CdS particles within a nanoporous aluminum oxide template

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Cited by 17 publications
(7 citation statements)
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“…42 At the same time, it can effectively inhibit the shuttling of polysuldes. At present, the preparation methods of thin layer MoS 2 mainly include the stripping method, 43 high temperature solid phase method, 44,45 template method 46 and hydrothermal method. 47 The MoS 2 layers are connected with each other by weak van der Waals forces, and delamination can be realized in theory.…”
Section: Research Situation Of Mos 2 As a Cathode Materials Of Li-s Bamentioning
confidence: 99%
“…42 At the same time, it can effectively inhibit the shuttling of polysuldes. At present, the preparation methods of thin layer MoS 2 mainly include the stripping method, 43 high temperature solid phase method, 44,45 template method 46 and hydrothermal method. 47 The MoS 2 layers are connected with each other by weak van der Waals forces, and delamination can be realized in theory.…”
Section: Research Situation Of Mos 2 As a Cathode Materials Of Li-s Bamentioning
confidence: 99%
“…This leads to third-order nonlinear optical effects. Agglomeration of particles must be avoided in preparation of these materials by dispersing the particles in polymers, [149] inside a multilayer, [150,151] pores, [152] and vesicles [153,154] . For example, the vesicle's internal diameter controls the particle size of cubic CdS.…”
Section: Surfactant Membrane-mediated Synthesismentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10][11][12][13] One of the fascinating aspects is the tunability of the interpore distance and pore diameter by simple variation of the anodization parameters [1,2,4,6,9,11,13] such as voltage and electrolyte solution composition. [13,[15][16][17][18][19][20] Many different materials, such as metals, both magnetic [21][22][23][24][25][26][27][28][29] and nonmagnetic, [30][31][32][33][34][35][36] semiconductors, [37][38][39][40][41][42][43]…”
Section: Introductionmentioning
confidence: 99%