2023
DOI: 10.1016/j.mseb.2023.116405
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Synthesis and characterization of Al-doped ZnO and Al/F co-doped ZnO thin films prepared by atomic layer deposition

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Cited by 10 publications
(6 citation statements)
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“…In these studies, optimal Al doping in a concentration range similar to that of the current study maximizes the conductivity of AZO nanostructures. [52][53][54][55][56][57] Fig. surrounded by zinc atoms with the full supplement of nearest neighbor O 2ions.…”
Section: Materials Advances Accepted Manuscriptmentioning
confidence: 99%
See 1 more Smart Citation
“…In these studies, optimal Al doping in a concentration range similar to that of the current study maximizes the conductivity of AZO nanostructures. [52][53][54][55][56][57] Fig. surrounded by zinc atoms with the full supplement of nearest neighbor O 2ions.…”
Section: Materials Advances Accepted Manuscriptmentioning
confidence: 99%
“…In these studies, optimal Al doping in a concentration range similar to that of the current study maximizes the conductivity of AZO nanostructures. [52][53][54][55][56][57] The observed changes in the electrical performance of the infiltration synthesized AZO nanowires can be attributed to the changes in the chemical state that occur due to differences in the TMA exposure time. To further understand these changes, XPS was carried out over AZO nanopatterns synthesized with different TMA exposure durations (Fig.…”
Section: Materials Advances Papermentioning
confidence: 99%
“…Therefore, in this work were using two economically attractive Zinc-Oxide NanoRods (ZnO NR) production based on Atomic Layer Deposition (ALD) and subsequent chemical bath 59,60 . This technique allows for fabrication of oxide materials upon very large surfaces significantly reducing the fabrication costs [61][62][63][64][65] .…”
Section: Piezoelectric-based Light Conversionmentioning
confidence: 99%
“…Above all, ALD is also used to grow thin films of metal oxides (MO) [11], e.g., ZnO [12][13][14][15][16], Al 2 O 3 [17,18], and TiO 2 [19,20]. Zinc oxide is a transparent oxide semiconductor with a direct band gap Eg = 3.4 eV [21].…”
Section: Introductionmentioning
confidence: 99%