In
this work, a radical coupling path was opened up for the construction
of C–O bonds in the reduction–etherification of 5-hydroxymethylfurfural
(HMF) by designing the unpaired electron defect-rich catalyst Cu/ZrO2. A decent 2,5-bis(isopropoxymethyl)furan (BPMF) yield (86.3%)
was obtained under the absence of H2 and external pressure.
A radical quenching experiment proved that the etherification process,
which is the key step for achieving BPMF, indeed belongs to a radical-related
route. Subsequently, a series of in situ FTIR, radical
capture experiment, and electron spin density analyses were used to
elucidate the formation of key radical intermediates at the molecular
level in which the O–H dissociation of 2.5-dihydroxymethylfuran
and C–O dissociation of isopropanol occurred on the zirconium-vacancy-adjacent
lattice oxygen atom (VZr–O–) and
oxygen vacancy (VO) sites, respectively. Furthermore, we
revealed the induction mechanism of the alkoxy radical intermediate
at the electronic level and the electron structure cycle process of
the unpaired electron VZr–O– sites
via a combination of density functional theoretical calculations and
isotope labeling. More importantly, the calculation result from Gaussian
showed that radical intermediates do not occur in a chain reaction
with unactivated molecules; thus, the optimal path of radical cross-coupling
to produce BPMF was clarified. The findings reported by this article
reveal the role of unpaired electron defects in opening up a radical
coupling path and thus broaden the downstream production of the high-value
transformation of HMF. Furthermore, this study could provide a reference
for the construction of C–O bonds in other heterogeneous reaction
systems.