Synergic effect of acetal-based resin by blending with poly[4-hydroxy styrene-co-tert-butyl acrylate-co-4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene)] (P(HS-TBA-CBPS)) on the profiles of 248 nm chemically amplified resist

Abstract

We prepared ter-polymer of hydroxystyrene, ter -butyl acrylate and 4-(3-cyano-1,5-di-tert-butyl carbonyl pentyl styrene) (P(HS-TBA-CBPS)) and discussed a characteristic of prepared polymer. As TBA, newly introduced monomer increases, contrast of resist is improved. And the prep ared polymer was blended with poly(4 -hydroxystyrene-co-4-(1-ethylethoxystyrene)) (EE-PHS). The synergic effect on a resist performance in KrF lithography by the combination of high and low activation energy system was shown. A resist using blending polymer was shown a good performance on resolution and LER(Line Edge Roughness) than resist using polymer separately. Based on the results, it was found that high performance KrF resist could be obtained by optimization of polymer blending.