In this work we use LEEM, XPEEM and XPS to study how the excess Si at the graphene-vacuum interface reorders itself at high temperatures. We show that silicon deposited at room temperature onto multilayer graphene films grown on the SiC(0001) rapidly diffuses to the graphene-SiC interface when heated to temperatures above 1020• C . In a sequence of depositions, we have been able to intercalate ∼ 6 ML of Si into the graphene-SiC interface.