Symmetry Engineering of Epitaxial Hf0.5Zr0.5O2 Ultrathin Films
Arnab De,
Min-Hyoung Jung,
Young-Hoon Kim
et al.
Abstract:Robust ferroelectricity in HfO2-based ultrathin
films
has the potential to revolutionize nonvolatile memory applications
in nanoscale electronic devices because of their compatibility with
the existing Si technology. However, to fully exploit the potential
of ferroelectric HfO2-based thin films, it is crucial to
develop strategies for the controlled stabilization of various HfO2-based polymorphs in nanoscale heterostructures. This study
demonstrates how substrate-orientation-induced anisotropic strain
can engi… Show more
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