“…To achieve a proximity that is relevant to ions used for quantum information, i.e., an ion distance, h 100 μm, from the surfaces, the trap should have features on this scale. In order to fabricate a stylus trap with features of 100 μm, we utilized UV-LIGA (a German acronym for lithography, electroplating, and molding) technology, [8][9][10][11][12] i.e., UV photolithograpy with a thick resist and subsequent metal electroforming with the use of electrodeposition. Using this technique, we have fabricated traps that consist of 150 μm tall structures (see Figs.…”