2013
DOI: 10.1016/j.watres.2013.09.008
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Survival of Escherichia coli in two sewage treatment plants using UV irradiation and chlorination for disinfection

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Cited by 80 publications
(29 citation statements)
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“…coli biomass entering a WWTP is comprised of these novel, stress-resistant strains and that they persist throughout the treatment stream (i.e., even after chlorine or UV treatment). It was previously reported by Anastasi and colleagues (76) that within the raw sewage influent, only a portion of the E. coli population survives the treatment process when either UV or chlorine is used for disinfection.…”
Section: Discussionmentioning
confidence: 99%
“…coli biomass entering a WWTP is comprised of these novel, stress-resistant strains and that they persist throughout the treatment stream (i.e., even after chlorine or UV treatment). It was previously reported by Anastasi and colleagues (76) that within the raw sewage influent, only a portion of the E. coli population survives the treatment process when either UV or chlorine is used for disinfection.…”
Section: Discussionmentioning
confidence: 99%
“…It also, requires special operation, and potentially forms bromate as a by-product in waters containing bromide [9,10]. Chlorine is a potent oxidant which causes the destruction of nucleic acids and cell membranes and it is an attractive option for disinfection due to its ease of handling, low capital cost and production of residual chlorine [11,12]. However, limitations in the use of chlorine include the production of off-tastes and odours, and potential formation of disinfection by-products (DBPs) such as trihalomethanes (THMs), Haloactic acids (HAAs), Haloacetylnitrile (HAN) and nitrosodimethylamine (NDMA) [13][14][15].…”
Section: Introductionmentioning
confidence: 99%
“…[6][7][8] Consequently, a number of physicochemical disinfection processes have been studied as alternatives to chlorination. [6][7][8] Consequently, a number of physicochemical disinfection processes have been studied as alternatives to chlorination.…”
Section: Introductionmentioning
confidence: 99%