2014
DOI: 10.7569/jrm.2013.634129
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Surface, Thermal and Antimicrobial Release Properties of Plasma-Treated Zein Films

Abstract: ABSTRACT:The effects of dielectric barrier discharge plasma treatment on zein film containing thymol as an active ingredient were evaluated. The plasma discharge was optically characterized to identify the reactive species. A significant increase in the film roughness (p < 0.05) was observed due to the etching effect of DBD plasma, which was correlated with the increase in the diffusion rate of thymol in the food simulant. The diffusion of thymol from the zein film was measured in aqueous solution. The kinetic… Show more

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Cited by 45 publications
(16 citation statements)
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“…High intensity peaks were observed in the wavelength range 310–430 nm which represent mostly excited nitrogen species, including nitrogen second positive system N 2 (C‐B) and first negative system N 2 + (B‐X). This air plasma emission spectrum was similar and comparable to emission spectra of other studies at atmospheric pressure . The OH (hydroxyl) peak was also observed around 300 nm along with the reactive nitrogen species.…”
Section: Resultssupporting
confidence: 88%
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“…High intensity peaks were observed in the wavelength range 310–430 nm which represent mostly excited nitrogen species, including nitrogen second positive system N 2 (C‐B) and first negative system N 2 + (B‐X). This air plasma emission spectrum was similar and comparable to emission spectra of other studies at atmospheric pressure . The OH (hydroxyl) peak was also observed around 300 nm along with the reactive nitrogen species.…”
Section: Resultssupporting
confidence: 88%
“…This air plasma emission spectrum was similar and comparable to emission spectra of other studies at atmospheric pressure. 15,21,35 The OH (hydroxyl) peak was also observed around 300 nm along with the reactive nitrogen species. Furthermore, at 725 and 777 nm, two excited atomic oxygen species O(5s 3 S → 3p 3 P) and O(2s 2 2p 3 3p 5 P → 2s 2 2p 3 3s 5 S) respectively were found.…”
Section: Optical Emission Spectroscopymentioning
confidence: 99%
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“…This leads to the increase in the surface roughness. A similar type of effect was observed in zein films (Pankaj et al, 2014) and black grams (Chaitanya Sarangapani et al, 2017) treated with plasma.…”
Section: Characterization Of Anisotropic Nature Of Xerogelsupporting
confidence: 67%
“…Applications of nanotechnology in packaging as become wide spread to improve the barrier properties of packing material and this can be achieved by cold plasma processing. Pankaj et al [93] studied the surface topography of zein film using atomic force microscopy [AFM]. The roughness of plasma treated zein film increased with a root mean square of 100 nm from 20 nm in untreated films this is due to surface etching occurred during plasma treatment.…”
Section: Effect On Packing Materialsmentioning
confidence: 99%