Surface temperature of a 2 in. Ti target during DC magnetron sputtering

Abstract

Recently, there has been increasing interest in the use of hot targets to enhance the sputter deposition of materials. However, the actual temperature of the target surface is normally not known. In this work, we directly measured the radial distribution of the surface temperature of a MAK 2 in. Ti water-cooled target using a type K thermocouple during the operation of the sputtering system. Principally, the measurements were made as a function of applied DC power and argon gas pressure. Given the importance of chemical reactions between the gas and the target during reactive sputtering, we have also measured the target temperature as a function of the nitrogen concentration in an argon-nitrogen gas mixture. A few of the reactively sputtered samples were analyzed by x-ray photoelectron spectroscopy.